2010
DOI: 10.18359/rcin.279
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Análisis estructural y morfológico de películas de nitruro de aluminio obtenidas por deposición de láser pulsado

Abstract: <span>En este trabajo, se presentan los resultados preliminares de películas nanoestructuradas de nitruro de aluminio (AlN), que fueron depositadas con el método de deposición por láser pulsado (PLD). Al efecto, se utilizó un láser Nd:YAG (¿=1064nm), que impacto un blanco de aluminio de alta pureza (4N), en una atmósfera de nitrógeno. Se utilizaron como sustratos portaobjetos de vidrio, Si3N4 (100) y Si (100). El tiempo de deposición fue de 15 minutos a una fluencia del láser 7 J/cm2 y a temperatura ambi… Show more

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Cited by 3 publications
(3 citation statements)
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“…Each data point in the plots represents an average over AFM images. The corresponding error bar was obtained by a standard deviation of the values (Mahmood et al, 2003;PEREZ TABORDA et al;Pérez Taborda et al, 2010;Taborda et al, 2015;Zhuang et al, 2009). Figure 10 shows the grain size and roughness values for the AlN films, thus, in this case, a decreasing tendency in surface measurements was observed when the deposition temperature was increased.…”
Section: Surface Analysis Of Aln Films Via Atomic Force Microscopementioning
confidence: 93%
“…Each data point in the plots represents an average over AFM images. The corresponding error bar was obtained by a standard deviation of the values (Mahmood et al, 2003;PEREZ TABORDA et al;Pérez Taborda et al, 2010;Taborda et al, 2015;Zhuang et al, 2009). Figure 10 shows the grain size and roughness values for the AlN films, thus, in this case, a decreasing tendency in surface measurements was observed when the deposition temperature was increased.…”
Section: Surface Analysis Of Aln Films Via Atomic Force Microscopementioning
confidence: 93%
“…The value of the binding energy obtained for the Al2p peak was 73.9 eV and the higher value for Al2p was 75.6 eV, respectively. According to the literature (Mahmood et al, 2003;Pérez Taborda, Riascos Landázuri, Jiménez García, & Caicedo Angulo, 2010;Taborda, Caicedo, Grisales, Saldarriaga, & Riascos, 2015) for the Al2p peak, the first one (73.9 eV) and the second one (75.6 eV) can be assigned to Al-N and Al-O bonds. The appearance of the peak at 73.9 eV clearly shows that Al has reacted with N; therefore, it can be assigned to Al-N.…”
Section: Figure 6 Xps Survey Spectrum Of Al-n Coatings Deposited On Si 3 N 4 At 300 °C Where Different Elemental Signals Showmentioning
confidence: 98%
“…Each data point in the plots represents an average over AFM images. The corresponding error bar was obtained by a standard deviation of the values (Mahmood et al, 2003;PEREZ TABORDA et al;Pérez Taborda et al, 2010;Taborda et al, 2015;Zhuang et al, 2009).…”
Section: Surface Analysis Of Aln Films Via Atomic Force Microscopementioning
confidence: 99%