1992
DOI: 10.1002/sca.4950140406
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Analysis of electron range versus energy relationship of insulators in low‐voltage scanning electron microscopy

Abstract: A theoretical analysis is made concerning the question of whether or not an insulator's surface is observable without the unstable disturbance due to negative charge-up in the secondary electron mode of a low-voltage scanning electron microscope. Introducing a simple modification into the elementary theory of secondary electron emission from solid materials, the threshold condition as to observability is formulated as a function of the energy E,, and the incident angle Qp of the primary beam. It is shown that … Show more

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Cited by 4 publications
(1 citation statement)
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“…Sugiyama et al (1986) verified this dependence experimentally on microelectronic devices coated with a nonconductive passivation layer. The formula is easy to derive under the assumption that the charge-building process is primarily dependent on the penetration depth of primary electrons so that quantitatively it is governed by the normal component vcosθ of the primary beam velocity v. Ishibashi et al (1992) studied a threshold energy E th = E P cos 2 θ , below which an insulator can be observed without unstable image disturbances. They found E th generally not constant; for example, for Si 3 N 4 , a relation E th~ (cosθ ) -0.5 was obtained, which corresponds to even stronger E II -θ dependence than that mentioned above.…”
Section: Limiting Factorsmentioning
confidence: 99%
“…Sugiyama et al (1986) verified this dependence experimentally on microelectronic devices coated with a nonconductive passivation layer. The formula is easy to derive under the assumption that the charge-building process is primarily dependent on the penetration depth of primary electrons so that quantitatively it is governed by the normal component vcosθ of the primary beam velocity v. Ishibashi et al (1992) studied a threshold energy E th = E P cos 2 θ , below which an insulator can be observed without unstable image disturbances. They found E th generally not constant; for example, for Si 3 N 4 , a relation E th~ (cosθ ) -0.5 was obtained, which corresponds to even stronger E II -θ dependence than that mentioned above.…”
Section: Limiting Factorsmentioning
confidence: 99%