Apparatus for the magnetron and ion-beam synthesis of multilayer structures

Zabrodin, I. G.; Zakalov, B. A.; Kas’kov, I. A.; Klyuenkov, E. B.; Полковников, В. Н.; Салащенко, Н. Н.; Starikov, S. A.; Suslov, L. A.

doi:10.1134/s1027451013040204

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Cited by 6 publications

(1 citation statement)

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“…Synthesis of the multilayer Mo/B 4 C structures was carried out by magnetron sputtering on the facility described by Zabrodin et al (2013). Before the technological process began, the pressure of the residual gases in the chamber was at a level of 10 À 7 mbar.…”

Section: Experimental Methodsmentioning

confidence: 99%

Investigation of structural and reflective characteristics of short-period Mo/B₄C multilayer X-ray mirrors

Shaposhnikov,

Polkovnikov,

Garakhin

et al. 2024

J Synchrotron Rad

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The results of a study of the structural and reflective characteristics of short-period multilayer X-ray mirrors based on Mo/B4C at wavelengths 1.54 Å, 9.89 Å and 17.59 Å are presented. The period of the samples varied in the range 8–35 Å. The average widths of the interfaces were ∼3.5 and 2.2 Å at one and the other boundaries, with a tendency for weak growth with any decrease in the period. The interlayer roughness was ∼1 Å. The research results indicate promising prospects for the use of multilayer Mo/B4C mirrors for synchrotron applications.

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Section: Experimental Methodsmentioning

confidence: 99%

Investigation of structural and reflective characteristics of short-period Mo/B₄C multilayer X-ray mirrors

Shaposhnikov,

Polkovnikov,

Garakhin

et al. 2024

J Synchrotron Rad

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Size control of silver nanoclusters during ion-assisted pulse-plasma deposition of carbon-silver composite thin films

Streletskiy

Zavidovskiy

Nischak

et al. 2020

Vacuum

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Projection Objective For an EUV-Lithographic Workbench

Егоров

Zorina

Malyshev

et al. 2020

J. Synch. Investig.

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Apparatus for the magnetron and ion-beam synthesis of multilayer structures

Cited by 6 publications

References 8 publications

Investigation of structural and reflective characteristics of short-period Mo/B₄C multilayer X-ray mirrors

Investigation of structural and reflective characteristics of short-period Mo/B₄C multilayer X-ray mirrors

Size control of silver nanoclusters during ion-assisted pulse-plasma deposition of carbon-silver composite thin films

Projection Objective For an EUV-Lithographic Workbench

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Apparatus for the magnetron and ion-beam synthesis of multilayer structures

Cited by 6 publications

References 8 publications

Investigation of structural and reflective characteristics of short-period Mo/B4C multilayer X-ray mirrors

Investigation of structural and reflective characteristics of short-period Mo/B4C multilayer X-ray mirrors

Size control of silver nanoclusters during ion-assisted pulse-plasma deposition of carbon-silver composite thin films

Projection Objective For an EUV-Lithographic Workbench

Contact Info

Product

Resources

About

Investigation of structural and reflective characteristics of short-period Mo/B₄C multilayer X-ray mirrors

Investigation of structural and reflective characteristics of short-period Mo/B₄C multilayer X-ray mirrors