Application of stencil masks for ion beam lithographic patterning

MeV ion beam lithography of biocompatible halogenated Parylenes using aperture masks

“…MeV 16 O + bombardment can be used for lithographically patterning Parylene-C and -F in a similar way to that reported for PTFE [5,6] using a broad beam in a parallel exposure process in combination with a stencil mask. The removal rate for Parylene-C and -F was about 25 times smaller than for PTFE.…”

“…This was done to facilitate measurement of the thickness of material removed using a stylus profilometer from the step height corresponding to the mask edge. A 50 lm PTFE sheet was also used in the study as a reference material because its properties under oxygen ion irradiation were previously studied [5,6]. Masks Irradiation was carried out at the 1.7 MV Tandetron in La Chauxde-Fonds in the ion irradiation end-station using magnetically rastered and neutral trapped 16 O + beams.…”

“…Of particular interest for surgical applications are the barrier properties of Parylene-C [3,4] and its high biocompatibility. Lithographic patterning of polytetrafluorethylene (PTFE), a linear chain fluoropolymer, has been reported using a MeV 16 O + beam [5,6] or other ion beams where the exposure takes place in a O 2 rich atmosphere [7] and in vacuum [8]. Here we report investigations into lithographic pattering of Parylene-C and -F and the biocompatibility after 1 MeV 16 O + irradiation.…”

Development of a microfluidic design for an automatic lab-on-chip operation

“…2013). Moreover, mass production of the channel structures is possible by so-called nanoimprint lithography (NIL) (Ansari et al 2006) or aperture/stencil mask MeV ion beam lithography (Brun et al 2013). Additionally, fabrication of PMMA/PMMA/Si microfluidic device using the PPAL technique is a fast development of a microfluidic prototype because of its maskless lithography method (Puttaraksa et al 2013).…”