Bias voltage dependence of properties for ZnO:Al films deposited on flexible substrate

Effects of sputtering power on the properties of ZnO:Ga films deposited by r.f. magnetron-sputtering at low temperature

“…This indicates that all of the obtained films were polycrystalline with the hexagonal wurtzite structure and had a preferred orientation with the c-axis perpendicular to the substrates. This result is the same with the structure of ZnO:Al films [14,15]. The c-axis orientation in ZnO:Ga films can be understood by the ''survival of the fastest'' model proposed by Drift [16].…”

The effect of substrate bias voltage on PbTe films deposited by magnetron sputtering

“…Das. This is due to the increased bias voltage attracting the ions to bombard the surface to provide extra energy for the growing films, resulting in a higher deposition rate [12]. Further increase of the substrate bias, the deposition rate decreases.…”

Effect of substrate bias on crystal structure and thermal stability of sputter-deposited ZnO films

“…It was reported that the bombardment of positive ions of argon with appropriate kinetic energy assisted the crystallization process of ZnO films; however, crystallize size decreased as the P sub further increased [16].…”

“…It is known that the substrate bias is an effective way to enhance the energy of positive ion to the growing surface due to negative self-bias of the substrate [15,16]. Therefore, the energy of positive ion could be controlled by the rf-power to the substrate.…”