2006
DOI: 10.1016/s1369-7021(06)71620-0
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Block copolymer patterns and templates

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Cited by 232 publications
(177 citation statements)
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“…A variety of nanoscale templates with vertically-aligned pores have been developed, which can either be filled with an appropriate semiconductor or used as masks for patterning underlying semiconductor layers. Relevant templates include self-assembling monolayers of nanoscale materials [37,39], anodic aluminum oxide (AAO) templates [40][41][42][43], and block copolymers [44,45].…”
Section: Template-assisted Synthesismentioning
confidence: 99%
See 1 more Smart Citation
“…A variety of nanoscale templates with vertically-aligned pores have been developed, which can either be filled with an appropriate semiconductor or used as masks for patterning underlying semiconductor layers. Relevant templates include self-assembling monolayers of nanoscale materials [37,39], anodic aluminum oxide (AAO) templates [40][41][42][43], and block copolymers [44,45].…”
Section: Template-assisted Synthesismentioning
confidence: 99%
“…Block copolymers are chemically-distinct polymers covalently bonded at one end that self-assemble into wellordered structures, including arrays of cylinders. Highlyoriented, nearly defect-free arrays of nanoscopic, cylindrical domains that span film thicknesses up to several microns and have a high degree of long-range lateral order have been produced [44,45]. The cylindrical phase can then be removed, leaving a template to be filled with nanowire material [99,106,107].…”
Section: Template-assisted Synthesis Of Ultra-low-cost Photovoltaic Nmentioning
confidence: 99%
“…Numerous reviews exist on block copolymers ranging from their thermodynamic properties to more applied research [26][27][28][29][30][31][32][33][34][35][36]. In this section, a short introduction to A-B diblock copolymer thin film nanostructures and the mechanisms behind the formation of ordered block copolymer nanopatterns are provided.…”
Section: Block Copolymer (Bcp) Thin Filmsmentioning
confidence: 99%
“…This 'multiscale lithographic' technique relies on using a 'top-down' lithographically defined template which imposes self-alignment (registration) and improves translational order on the 'bottom-up' self assembled polymer system; subdividing the feature size (resolution enhancement technique) of the overall process (figure 9). Many reviews have been written on the graphoepitaxy of block copolymers [26][27][28][29][30][31][32][33]106], so we have focused below on the major milestones since Segalman et al [90] first demonstrated this approach as a viable method in 2001.…”
Section: Graphoepitaxymentioning
confidence: 99%
“…8 There are four types of self-assembly masks: metal, nanospheres, copolymer, and deliquescent salts. Metal nanodots (Ag) 9 can easily contaminate substrates and are hard to remove, diversified inorganic (silica) 10 and organic (colloids) 11 nanospheres tend to agglomerate, copolymer micells' 12 diameter is limited, while deliquescent salt masks have the advantages of easy mask removing, high etch selectivity, high coverage, wide diameter range and compatibility. CsCl is one of such deliquescent salts and it's easy to acquire.…”
Section: Introductionmentioning
confidence: 99%