“…Therefore the heteroepitaxial growth of thick GaN layers by hydride vapor phase epitaxy (HVPE) has been developed by several groups [1,2] which can be used as quasi-substrates for device epitaxy. On such layers, excellent electronic and optoelectronic devices, in particular laser diodes [3] and light emitting diodes [4], have been fabricated. The HVPE grown layers, however, still suffer from several problems.…”