Bragg holograms with binary synthetic surface-relief profile

Turunen, Jari; Blair, P.; Miller, J. M.; Taghizadeh, Mohammad R.; Noponen, Eero

doi:10.1364/ol.18.001022

Cited by 21 publications

(7 citation statements)

References 15 publications

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“…Choosing, for example, n s = n r = 1.45 (SiO 2 ) at a design wavelength λ = 1064 nm and apply the Fourier modal method as in Turunen et al . 21 , we obtain η −1 ≈ 97% with a design d = 958 nm, w = d /2, and h = 1851 nm. Figure 3(a) shows a scale drawing of the structure and Fig.…”

Section: Fabrication Methods and General Design Issuesmentioning

confidence: 76%

“…In the forthcoming sections we will consider GMRFs in detail, but some of the design issues discussed above can be illustrated more clearly using Bragg-type surface-relief gratings as underlying structures. Such gratings have been used, e.g., as carrier gratings in coding complex optical signals in diffractive optics 21 – 23 . The optical function of a (regular transmission-type) Bragg grating is to diffract a maximum fraction η −1 of incident light into the first diffraction order m = −1, when illuminated at the Bragg angle θ = θ B given by .…”

Section: Fabrication Methods and General Design Issuesmentioning

confidence: 99%

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Fabrication of buried nanostructures by atomic layer deposition

Ali

Saleem

Roussey

et al. 2018

Sci Rep

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We present a method for fabricating buried nanostructures by growing a dielectric cover layer on a corrugated surface profile by atomic layer deposition of TiO2. Selecting appropriate process parameters, the conformal growth of TiO2 results in a smooth, nearly flat-top surface of the structure. Such a hard surface can be easily cleaned without damage, making the nanostructure reusable after contamination. The technique has wide applicability in resonance-domain diffractive optics and in realization of quasi-planar metamaterials. We discuss design issues of such optical elements and demonstrate the method by fabricating narrow-band spectral filters based on the guided-mode resonance effect. These elements have strong potential for, e.g., sensing applications in harsh conditions.

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Section: Fabrication Methods and General Design Issuesmentioning

confidence: 76%

Section: Fabrication Methods and General Design Issuesmentioning

confidence: 99%

Fabrication of buried nanostructures by atomic layer deposition

Ali

Saleem

Roussey

et al. 2018

Sci Rep

Self Cite

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“…Reported attempts at fabricating pulse-width modulated structures include a metallic reflection grating 7 for operation at 10.6 m and blazed transmission gratings in silicon 8 for operation at 1.55 m and in fused quartz 9 for operation at 633 nm. Pulseposition modulation has been used to demonstrate a reflective binary Bragg-type multibeam splitter at 1.064 m. 10 In this previous work, the demonstrated efficiencies are not as high and/or the demonstrated diffractive optics are not as ambitious ͑in terms of equivalent lens speed͒ as that reported here.…”

Section: Introductionmentioning

confidence: 68%

Nanofabrication of subwavelength, binary, high-efficiency diffractive optical elements in GaAs

Wendt

Vawter

Smith

et al. 1995

Journal of Vacuum Science &Amp; Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

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A single-etch-step process for the fabrication of high-efficiency diffractive optical elements is presented. The technique uses subwavelength surface relief structures to create a material with an effective index of refraction determined by the fill factor of the binary pattern. Fabrication is performed using electron beam lithography and reactive-ion-beam etching on bulk GaAs, but the process is applicable to any material for which well-controlled etches exist. In this work, we designed and fabricated a blazed transmission grating for operation at 975 nm. The blazed grating exhibits a diffraction efficiency into the first order of 85% of the transmitted power.

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“…The chance to satisfy this condition depends on the constraint t c itself, the actual ® elds U in and U sig as well as the distances D z 1 and D z 3 . To evaluate the amplitude matching condition (15) it is helpful to introduce a measure S . A suitable choice, which also oå ers a further physical interpretation, can be de® ned by…”

Section: Amplitude Matching Strategymentioning

confidence: 99%

Amplitude matching strategy for wave-optical design of monofunctional systems

Schimmel

Wyrowski

2000

Journal of Modern Optics

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The design of optical systems capable of transforming one given input ® eld into an output ® eld which maximizes one prescribed merit function is discussed in the functional embodiment of the system, that is by dealing with transmission functions instead of structured matter. Customary beam shaping techniques are identi® ed as a special case of a more general strategy which is called amplitude matching. This strategy makes use of the ® eld quantities amplitude and phase and therefore it is a wave-optical design approach. Thē exibility of the technique is demonstrated by various examples. Parameters like conversion eae ciency, signal-to-noise ratio, distances between transmission functions, and the number of transmission functions necessary for the implementation of wave transformations are discussed. IntroductionMost optical systems are designed to transport and transform a set of waves in a homogeneous dielectric input region into another set of waves in a homogeneous dielectric output region. The waves in the output region must satisfy prescribed quality criteria. In the following we apply some restrictions to this very general situation. (1) The refractive index in the input and output regions obeys nˆ1.(2) Monochromatic and coherent waves are assumed. (3) We consider only one scalar component U of the electromagnetic ® eld. The general vectorial case may be understood as a two channel generalization of the strategy described below, as long as the system response on both independent scalar components is decoupled, that is for instance a polarization conversion does not occur. (4) The monofunctional case is addressed, that is the system is designed to transform one speci® ed input wave into an output wave which satis® es one prescribed merit function. (5) The structure of the system is mathematically speci® ed by the refractive index of a linear, isotropic and inhomogeneous dielectric, that is n…x ; y ; z †, in a region z in µ z µ z out . By restriction to a dielectric we avoid absorption eå ects and emphasize the transmission mode of operation. The re¯ection mode of operation may be considered analogously. The xy planes through z in and z out indicate the input and output planes of the system.According to the spectrum of plane waves representation (e.g. see [1] section 3.2) the input wave U in …x ; y ; z µ z in † and the output wave U out …x ; y ; z ¶ z out † are completely speci® ed by the ® elds U inˆUin …x ; y ; z in † and U outˆUout …x ; y ; z out † respectively. Thus, in what follows we consider the input and output ® elds U in and U out .

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Bragg holograms with binary synthetic surface-relief profile

Cited by 21 publications

References 15 publications

Fabrication of buried nanostructures by atomic layer deposition

Fabrication of buried nanostructures by atomic layer deposition

Nanofabrication of subwavelength, binary, high-efficiency diffractive optical elements in GaAs

Amplitude matching strategy for wave-optical design of monofunctional systems

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