Characteristics of ZnO thin films deposited onto Al/Si substrates by r.f. magnetron sputtering

Yoon, Ki Hyun; Choi, Jiwon; Lee, Dong-Heon

doi:10.1016/s0040-6090(96)09568-5

Cited by 85 publications

(11 citation statements)

References 25 publications

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“…ZnO thin films are produced on silicon substrate by RF magnetron sputtering deposition [9][10][11], which are deposited at different sputtering powers. The chamber is first evacuated to 10 −6 Pa and then the oxygen/argon gas mixture is introduced for film deposition.…”

Section: Methodsmentioning

confidence: 99%

Nanotribology and fractal analysis of ZnO thin films using scanning probe microscopy

Fang

Chuu

2003

J. Phys. D: Appl. Phys.

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Characteristics of crystalline structure, roughness and nanotribology of ZnO thin films deposited under various power conditions were achieved by means of x-ray diffraction and scanning probe microscopy (SPM). The ZnO thin films were deposited on the silicon (100) substrates by a radio frequency magnetron sputtering system. Fractal analysis was derived from SPM images, to calculate the fractal dimension complexity of the surface geometry, via a substituting structure function. The results show that the roughness decreases and nanowear rate increases as the sputtering power increases. In addition, the fractal dimensions of the ZnO thin films are also presented.

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Section: Methodsmentioning

confidence: 99%

Nanotribology and fractal analysis of ZnO thin films using scanning probe microscopy

Fang

Chuu

2003

J. Phys. D: Appl. Phys.

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“…The O I component at the low binding energy of around 530.05 eV can be attributed to the oxygen in the ZnO structure binding with Zn or substitutional Al, 20 whereas the other component located at around 531.74 eV resulted from absorbed oxygen such as chemisorbed O − . 21,22 The relative portions of O 1s spectrums were O I (22.3%) and O II (77.7%) in AZO film, while those were O I (21.1%) and O II (78.9%) in BAZO at surface state. However, the difference in each spectrum was detected for 100 nm-etched films by depth profiling of XPS, as is shown in Fig.…”

Section: B Contentmentioning

confidence: 99%

Boron and Aluminum Codoped ZnO Transparent Conducting Films with High Electrical Stability

Kang

Kwon

Lee

et al. 2011

J. Electrochem. Soc.

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We suggest boron (B) and aluminum (Al) codoped ZnO (BAZO) transparent conducting thin films with high electrical stability for photovoltaic applications. The resistivity of widely used Al-doped ZnO (AZO) film decreased slightly by B doping. Above all, the resistivity of BAZO (4.9 at. % boron) increased by less than 1.5 times, whereas that of reference AZO film increased by over than 8 times after thermal annealing in atmospheric air. The carrier concentration and Hall mobility were much less degraded in BAZO films. X-ray photoelectron spectroscopy analysis showed that the peak portion related with chemisorbed oxygen at 100 nm-inside of the film was suppressed in BAZO film compared with AZO film. The B atoms would restrain the oxygen permeation into the film, which made the process of oxygen chemisorption inactive.

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“…Zinc oxide (ZnO) thin films are widely used in variety of applications such as thin-film transistor [1], transparent conducting films, solar cell material [2], UV photodetector [3], piezoelectric [4] and wear-resistant films [5], due to its several favorable properties, including wide bandgap, e.g. -3.37 eV [6], large exciton binding energy (60 meV) [6] and also having good transparency, which are excellent parameters for optoelectronic devices.…”

Section: Introductionmentioning

confidence: 99%

Fabrication and characterization of electrodeposited and magnetron-sputtered thin films

Khan¹,

Pashaei²,

Bajwa³

et al. 2015

Int. J. CMEM

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The MnO-Zn thin films were fabricated by radio frequency (RF) magnetron sputtering and compared with pulse electrodeposition (PED) Zn thin films, doped with MnO and ZrO nanoparticles. Surface morphology, structural properties, chemical composition and corrosion resistance of these coatings were investigated by using scanning electron microscopy, X-ray diffraction (XRD), energy-dispersive X-ray spectroscopy, 3-D scanning interferometry and environmental chamber. Surface morphology and degree of crystallinity have different behaviours for different deposition methods. Pulse-coated films have polycrystalline structure with high surface roughness (R a ), whereas sputtered films are monocrystalline with reduced roughness (R a ). Corrosion tests of both RF sputter and PED films revealed that the distribution of corrosion products formed on the surface of sputter films were not severe in extent as in case of electrodeposited coatings. Results showed that the doping of ZrO nano-sized particles in Zn matrix and Mn-Zn composite films significantly improved the corrosion resistance of PED thin films. High electron mobility [7] and room temperature electrical conductivity of ZnO thin films make it perfect material for electronics equipment. Additional advantages of ZnO thin films and micro-nanostructure are abundance and non-toxicity of the ZnO material, low cast and quantum size effect. Depending on the application, tuning properties and band gap of ZnO is possible by doping another material such as: aluminum (Al), gallium (Ga), magnesium (Mg) and manganese (Mn).Also, there are advanced techniques of growing ZnO thin films and manufacturing such as metal organic chemical vapor deposition [8], radio frequency (RF) magnetron sputtering [9], sol-gel method and pulsed laser deposition [10]. Properties of ZnO thin films are investigated by using molecular beam epitaxy [11].Zinc plating is extensively used in corrosion protection of steel in many structural and general engineering applications. Zn coating on steel substrate provides with physical and mechanical properties as well as good corrosion resistance [12]. However, a high dissolution rate and low corrosion resistance limit the use of Zn coatings. In recent research and development activity on zinc-based alloy coatings, there is a growing interest in the use of Zn with various alloying elements like Mn and Zr. These elements (Mn and Zr) have an electrically, more negative potential (E°M n

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Characteristics of ZnO thin films deposited onto Al/Si substrates by r.f. magnetron sputtering

Cited by 85 publications

References 25 publications

Nanotribology and fractal analysis of ZnO thin films using scanning probe microscopy

Nanotribology and fractal analysis of ZnO thin films using scanning probe microscopy

Boron and Aluminum Codoped ZnO Transparent Conducting Films with High Electrical Stability

Fabrication and characterization of electrodeposited and magnetron-sputtered thin films

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