CoCr-sputtering in large scale roll coating systems

Mayr, Matthias; Ludwig, Ryan; Kastner, Katharina; Kukla, R.; Dalmann, B.; Haberkorn, H.; Hitzfeld, M.

doi:10.1109/tmag.1987.1065233

Cited by 12 publications

(3 citation statements)

References 7 publications

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“…t.Rd is thought to occur, when ionized-sputtered atoms are trapped by Vb not to reach the deposition surface, too. The mean free path of the sputtered atoms in the RFMS shown in Table 1 means that the energy of sputtered atoms on the deposition surface decrease to almost thermalized level [5]. Therefore, t.Rd has been presumably caused by resputtering in the RFMS system.…”

Section: Methodsmentioning

confidence: 99%

CONTROL OF CRYSTALLINITY AND MICROSTRUCTURE OF Co-Cr FILMS BY CLUSTER FORMATION IN AN OPPOSING TARGET SPUTTERING

Kadokura

Naoe

1991

J. Magn. Soc. Jpn.

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The opposing target sputtering (OTS) is characterized to be a unique method for microcluster fonnation of any high melting-point materials. This method was applied to form Co-cr films for discussing thin film formation process compared with RF magnetron sputtering and DC magnetron sputtering. Co-Cr film fonnation with the OTS is characterized on the following properties for high density magnetic recording media. Densely packed microstructures of small-sized particles are typically observed to be in the Co-Cr thin films prepared by the OTS. High c-axis crystallite orientation of h.c.p. structure can be obtained from less than 20 nm-thick Co-cr films by the OTS. More than 1000 oe of perpendicular coercivity was obtained at lower substrate temperature than 150°C. It is thought that the effects of cluster formation and reduced energy loss of sputtered-atoms in the OTS process take out the above properties on the Co-Cr films.

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Section: Methodsmentioning

confidence: 99%

CONTROL OF CRYSTALLINITY AND MICROSTRUCTURE OF Co-Cr FILMS BY CLUSTER FORMATION IN AN OPPOSING TARGET SPUTTERING

Kadokura

Naoe

1991

J. Magn. Soc. Jpn.

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“…Table 2. Sputtering conditions of the DCMS [9] and theOTS DCMS coater [9] . " PEN (polyethylene 2,6-naphthalate)…”

Section: Microstructure and Magnetic Propertiesmentioning

confidence: 99%

ON CHARACTERISTICS OF SPUTTERED Co-Cr-Ta MEDIA USING PEN FILM SUBSTRATE FOR HIGH DENSITY MAGNETIC RECORDING

et al. 1991

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-. A roll coater of the Opposing Targets Sputtering and the TEONEX® (PEN) film substrate were used to prepare continuous webs for Co-Cr-Ta thin film media. And surface roughness, microstructure and magnetic properties of the continuous webs were studied in this paper. The webs obtained under the argon gas pressure in the range of 0.15 to 0.75 Pa and the roll temperature of approx. 150°C, showed the following properties which will make the development of thin film media prospective on reliability and manufacturability. Microstructures in the Co-Cr-Ta thin films of 150 nm thickness were observed to be Co-rich particles of some 20 nm in diameter being packed densely and homogeneously, segregated by 2 nm-thick Cr-rich boundary layers. Surface roughness (Rmax) and magnetic properties of the webs were almost constant and showed high quality (Rmax < 10 nm, Hc.l ~ 1000 oe, HCII::;; 260 oe and Hk -4.3 koe).

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“…I n order to improve these, a gap-type target (GT) [5], a n inter-poles magnetron target (lPT/F) [6], and a facing target sputtering (FTS) system [7] have been developed. These new sources were effective for t h e continuous preparation of CO-Cr flexible media, realizing a long operation time and high-rate sputtering [5,6,8]. I n the case of continuous deposition, scattered atoms from various directions are collected on a base film which moves above t h e sources.…”

Section: Introductionmentioning

confidence: 99%

Properties of perpendicular recording media continuously prepared with new sputtering sources

et al. 1991

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A new sputtering source (named SPT target) h a s been investigated for continuous preparation of a CO-Cr composite perpendicular recording medium. A very low discharge voltage was established at a low worMng pressure. A high recovery of the emitted material and low temperature high-rate sputtering has been achieved at tbc same time. The prepared Permalloy film exhibiled soft enongh magnetic properties and a high crystal orientation for a back layer of the medium. Some optimum conditions for the continuous preparation of a CO-Cr layer, realizing a higher crystallinity a r e also discussed.

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CoCr-sputtering in large scale roll coating systems

Cited by 12 publications

References 7 publications

CONTROL OF CRYSTALLINITY AND MICROSTRUCTURE OF Co-Cr FILMS BY CLUSTER FORMATION IN AN OPPOSING TARGET SPUTTERING

CONTROL OF CRYSTALLINITY AND MICROSTRUCTURE OF Co-Cr FILMS BY CLUSTER FORMATION IN AN OPPOSING TARGET SPUTTERING

ON CHARACTERISTICS OF SPUTTERED Co-Cr-Ta MEDIA USING PEN FILM SUBSTRATE FOR HIGH DENSITY MAGNETIC RECORDING

Properties of perpendicular recording media continuously prepared with new sputtering sources

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