Complementary patterning demonstration with e-beam direct writer and spacer DP process of 11nm node

Komami, Hideaki; Abe, Kenji; Bunya, Keita; Isobe, Hideaki; Takizawa, Masahiro; Kurokawa, Masaki; Yamada, Akio; Yaegashi, Hietami; Oyama, Kenichi; Yamauchi, Shohei

doi:10.1117/12.915821

“…This is an example of complementary or hybrid lithography [7,8,9]. In this paper, we assume variable-shaped beam (VSB) method [10] is used in e-beam lithography.…”

Section: Introductionmentioning

confidence: 99%

Throughput Optimization for SADP and E-beam based Manufacturing of 1D Layout

Ding

¹

,

Chu

²

,

Mak

³

2014

Proceedings of the 51st Annual Design Automation Conference

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Due to the resolution limitations of optical lithography equipment, 1D gridded layout design is gaining steam. Self-aligned double patterning (SADP) is a mature technology for printing 1D layouts. However, for 20nm and beyond, SADP using a single trim mask becomes insufficient for printing all 1D layouts. A viable solution is to complement SADP with ebeam lithography. In this paper, in order to increase the throughput of printing a 1D layout, we consider the problem of e-beam shot count minimization subject to bounded line end extension constraints. Two different approaches of utilizing the trim mask and e-beam to print a layout are considered. The first approach is under the assumption that the trim mask and e-beam are used for end cutting. The second is under the assumption that the trim mask and e-beam are used to rid of all unnecessary portions. We propose elegant ILP formulations for both approaches. Experimental results show that both ILP formulations can be solved efficiently. The pros and cons of the two approaches for manufacturing 1D layout are discussed.

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“…As a solution, it is possible to apply the trim mask to rid of most of the unwanted portions / print most of the cuts and then apply e-beam lithography to remove the remaining unwanted portions / print the remaining cuts. This is an example of complementary or hybrid lithography [7,8,9]. In this paper, we assume variable-shaped beam (VSB) method [10] is used in e-beam lithography.…”

Section: Introductionmentioning

confidence: 99%

Throughput optimization for SADP and e-beam based manufacturing of 1D layout

Ding¹,

Chu²,

Mak³

2014

2014 51st ACM/EDAC/IEEE Design Automation Conference (DAC)

View full text Add to dashboard Cite

Due to the resolution limitations of optical lithography equipment, 1D gridded layout design is gaining steam. Self-aligned double patterning (SADP) is a mature technology for printing 1D layouts. However, for 20nm and beyond, SADP using a single trim mask becomes insufficient for printing all 1D layouts. A viable solution is to complement SADP with ebeam lithography. In this paper, in order to increase the throughput of printing a 1D layout, we consider the problem of e-beam shot count minimization subject to bounded line end extension constraints. Two different approaches of utilizing the trim mask and e-beam to print a layout are considered. The first approach is under the assumption that the trim mask and e-beam are used for end cutting. The second is under the assumption that the trim mask and e-beam are used to rid of all unnecessary portions. We propose elegant ILP formulations for both approaches. Experimental results show that both ILP formulations can be solved efficiently. The pros and cons of the two approaches for manufacturing 1D layout are discussed.

show abstract