2002
DOI: 10.1016/s0169-4332(02)00150-2
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Corrosion study at Cu–Al interface in microelectronics packaging

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Cited by 92 publications
(43 citation statements)
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“…During the period from 1995 to 2002, there were few studies of note on copper, except for Tan et al [26] in 2002, which described silicon cratering as '..a major hurdle to overcome..' and like previous studies concluded Pull strength (grams force) 8 22 that higher ultrasound needed to soften copper balls causes more cratering and that harder bond pads could help in eliminating cratering. Tan described PCT experiments on un-moulded copper ball bonds [27] bonded at 350°C and observed high shear forces with time and a drastic reduction of shear force due to corrosion and formation of copper and aluminium oxides. Cratering initially increased but decreased as the shear strength of the ball bonds reduced which was attributed to formation of oxides that weakened the bond and caused interfacial failure.…”
Section: Reliability Studies 1980-2002mentioning
confidence: 99%
“…During the period from 1995 to 2002, there were few studies of note on copper, except for Tan et al [26] in 2002, which described silicon cratering as '..a major hurdle to overcome..' and like previous studies concluded Pull strength (grams force) 8 22 that higher ultrasound needed to soften copper balls causes more cratering and that harder bond pads could help in eliminating cratering. Tan described PCT experiments on un-moulded copper ball bonds [27] bonded at 350°C and observed high shear forces with time and a drastic reduction of shear force due to corrosion and formation of copper and aluminium oxides. Cratering initially increased but decreased as the shear strength of the ball bonds reduced which was attributed to formation of oxides that weakened the bond and caused interfacial failure.…”
Section: Reliability Studies 1980-2002mentioning
confidence: 99%
“…Among these techniques, the wire bonding technology is a technique which connects aluminium pad of chip with lead frame of package by gold wire and is already a very commonly used technology. But recently defects in this wire bonding are increasing (Tan et al, 2002;Goh et al, 2013). As well known, many kinds of chemicals are used and various kinds of particles form in the semiconductor manufacturing process and airborne molecular contaminations (AMCs) from these chemicals.…”
Section: Introductionmentioning
confidence: 99%
“…Cu ball bond is more susceptible to moisture corrosion compared to gold ball bonds and undergo different corrosion mechanisms in microelectronic packaging [19][20][21]. There are different ball bonds corrosion mechanisms of Au and Cu ball bond under humid reliability test.…”
Section: Introductionmentioning
confidence: 99%