Deep-UV immersion interferometric lithography

Raub, Alex K.; Frauenglass, A.; Brueck, S. R. J.; Conley, Will; Dammel, Ralph R.; Romano, Andy; Sato, Masaru; Hinsberg, William D.

doi:10.1117/12.536772

Cited by 13 publications

(7 citation statements)

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“…Features as small as 45 nm can be fabricated when combined with water-immersion lithography [2,7]. Even smaller dimensions can be contemplated by combining 193 nm illumination with a higher index matching fluid [4].…”

Section: The Ultimate Feature Sizes Achievable By Ilmentioning

confidence: 99%

Interference lithography: a powerful tool for fabricating periodic structures

Lipson²

2010

Laser & Photonics Reviews

268

174

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In this review the basic principles of interference lithography (IL) are described. IL is emerging as one of the most powerful yet relatively inexpensive methodologies for creating large-area patterns with micron-to sub-micron periodicities.-dimensional periodic structures ( ) can be obtained by interfering ( ) non-coplanar beams in a photoresist. The symmetry and shape of the "unit cell" can be conveniently controlled by varying the intensities, geometries, polarizations, and phases of the beams involved. IL done with shorter wavelength lasers and/or liquid immersion lithography can create features with sub-50 nm dimensions. Such periodic structures are beginning to find wide use in photonic crystal science, optical telecommunications, data storage, and the integrated circuit industry. Newer innovations such as diffraction element assisted lithography or DEAL and phase-controlled IL for making twodimensional structures are also discussed.SEM images of two-dimensional patterns created by three-beam non-coplanar interference lithography. The upper left hand image corresponds to the case when the phases of the three beams used to make the exposure are equal. The remaining images correspond to situations where one laser beam has been given a different phase relative to the other two beams when making the exposure.

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Section: The Ultimate Feature Sizes Achievable By Ilmentioning

confidence: 99%

Interference lithography: a powerful tool for fabricating periodic structures

Lipson²

2010

Laser & Photonics Reviews

268

174

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“…Although it is generally accepted as an ideal fluid for ArF immersion in the sense of optical properties, water has been found to interact with photoresists by penetrating through photoresist film and extracting photoresist components 7,8 . This is because water is a molecule small in size, and high in polarity which makes it a good solvent for polar molecules, so that it can penetrate through photoresist film with relative ease, and extract polar compounds, such as photo-acid generators (PAGs), acids (generated form PAG after exposure), and amine additives in the film.…”

Section: Jsr's Approach To Hifmentioning

confidence: 99%

Material design for immersion lithography with high refractive index fluid (HIF)

et al. 2005

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ArF immersion lithography is considered as the most promising next generation technology which enables to a 45 nm node device manufacturing and below. Not only depth of focus enlargement, immersion lithography enables to use hyper numerical aperture (NA) larger than 1.0 and achieve higher resolution capability. For 193nm lithography, water is an ideal immersion fluid, providing suitable refractive index and transmission properties. Furthermore the higher refractive index fluid is expected to provide a potential extension of optical lithography to the 32 nm node. This paper describes the material design for immersion lithography with high refractive index fluid. We have developed promising high refractive index fluids which satisfy the requirement for immersion fluid by screening wide variety of organic compounds. The physical and chemical properties of this high refractive index fluid are discussed in detail. Also the topcoat material which has good matching with high refractive index fluid is developed. While this topcoat material is soluble into aqueous TMAH developer, it does not dissolve into water or high refractive index fluid and gives suitable contact angle for immersion scan exposure. Immersion exposure experiments using high refractive index fluid with and w/o topcoat material was carried out and its lithographic performance is presented in this paper.

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“…On the experimental point of view, one of the difficulties for interferometry in the DUV range is due to the low coherence of available DUV lasers. As an example, typical coherence of ArF lasers is limited to a few hundreds of microns, which justifies efforts to develop specific experimental setup for short wavelengths (Figure 1 (Bourov et al, 2004), b) Lloyd setup (Raub & Brueck, 2003) and c) achromatic holographic configuration (Yen et al, 1992) Holographic grating formation has been proposed (Askins et al, 1992;Archambault et al, 1993). However, in all cases, it has been necessary to increase the spatial coherence and decrease the spectral emission band width of excimer lasers, which considerably increase the laser system complexity and demonstrations have been mostly done with 248 nm lasers.…”

Section: Wwwintechopencommentioning

confidence: 99%

“…The interest of this configuration is to be compatible with immersion. However, it is limited in laser sources since it requires spatial coherence higher than what is available with excimer lasers (Raub &Brueck, 2003). -A fourth approach relies on the use of diffraction element designed to generate two coherent beams.…”

Section: Wwwintechopencommentioning

confidence: 99%