Deposition of diamond-like carbon film using dense plasma focus

Zeb, Shaista; Sadiq, Muhammad; Qayyum, A.; Murtaza, G.; Zakaullah, M.

doi:10.1016/j.matchemphys.2007.02.020

Cited by 37 publications

(15 citation statements)

References 22 publications

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“…But the detailed analysis of the structure and properties of ZrC films formed at low substrate temperatures are still required. Unlike the techniques mentioned, ion beam-assisted deposition using plasma focus device can deposit solid films on conventional materials at near room temperature [12][13][14][15][16]. Energetic ion bombardment with higher ion flux may provide additional energy to enhance film formation and surface modification processes, so that some compounds and metastable phases can be formed at room temperature.…”

Section: Introductionmentioning

confidence: 99%

“…It is an excellent and powerful device for the generation of X-rays, neutron, relativistic electron and energetic ion beams [12,18]. The energetic ion beams emitted from the plasma focus device have been used for a variety of applications like surface properties modification, thin film deposition, ion assisted coating and ion implantation [12][13][14][15][16]19,20]. Due to heating of specimen by the energetic ions beams emitted from focus region, separate heating of specimen during the implantation can be avoided.…”

Section: Introductionmentioning

confidence: 99%

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Carburizing of zirconium using a low energy Mather type plasma focus

Murtaza

Hussain

Rehman

et al. 2011

Surface and Coatings Technology

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Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Carburizing of zirconium using a low energy Mather type plasma focus

Murtaza

Hussain

Rehman

et al. 2011

Surface and Coatings Technology

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“…As mentioned earlier, the plasma focus device has been recently used for various thin films deposition and as a source of high energy ions for material processing. Rawat et al [21] used a 3.3 kJ plasma focus device to deposit the TiN thin films on the stainless steel substrates, Zakaullah et al [26] applied a 1.45 kJ dense plasma focus device to deposit the diamond-like carbon films on the silicon substrates, Lee et al [25] took advantage of a 2.3 kJ plasma focus device for ion implantation of nitrogen on the titanium substrates to synthesize the titanium nitride coatings. In this experiment, different axial distances from the anode tip and also various angular positions at the distance of 5 cm from the top of the anode have been used to deposit the chromium thin films.…”

Section: Introductionmentioning

confidence: 99%

Deposition of Chromium Thin Films on Stainless Steel-304 Substrates Using a Low Energy Plasma Focus Device

et al. 2011

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In this paper, we study thin films of chromium deposited on stainless steel-304 substrates using a low energy (1.6 kJ) plasma focus device. The films of chromium are likewise deposited with 25 focus shots each at various axial distances from the top of the anode (3, 5, 7, 9 and 11 cm). We also consider different angular positions with respect to the anode axis (0°, 15°and 30°) at a distance of 5 cm from the anode tip to deposit the chromium films on the stainless steel substrates. To characterize the structural properties of the films, we benefit from X-ray diffraction (XRD) analysis. Atomic force microscopy (AFM) and scanning electron microscopy (SEM) are applied as well to study the surface morphology of these deposited films. Furthermore, we make use of Vicker's micro-hardness measurements to investigate the mechanical properties of chromium thin films. The XRD results show that the degree of crystallinity of chromium thin films depends on the substrate axial and angular positions. The AFM images illustrate that the film deposited at the distance of 5 cm and the angular position of 0°has quite a uniform surface with homogeneous distribution of grains on the film surface. From the hardness results, we observe that the sample deposited at the axial distance of 5 cm from the anode tip and at the angle of 0°with respect to the anode axis, is harder than the other deposited films.

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“…There are many novel processes that a DPF can be developed for by utilizing the ion and electron product, especially when it involves the synthesis or processing of materials instead of a source of radiation [3]. The DPF device has proven to be able to synthesize a variety of materials such as titanium carbide [4], titanium nitride [5]- [8], titanium oxycarbide [9], titanium dioxide [10], cobalt platinum (CoPt) [11], iron cobalt (FeCo) [3], diamond-likecarbon (DLC) [12], [13], tungsten nitride [14], lead zirconate titanate [15], silicon carbide [16], [17], and hafnium oxide [18] by selecting the appropriate working gas and anode material. These nanostructured thin films are easily formed due to the ablation of the anode material by the electron beam resulted from the pinch and through the mixing of the ionized gas derived from hot dense plasma in focus device.…”

mentioning

confidence: 99%

“…These nanostructured thin films are easily formed due to the ablation of the anode material by the electron beam resulted from the pinch and through the mixing of the ionized gas derived from hot dense plasma in focus device. The advantage of the DPF in nanostructured thin-film synthesis is due to its flexibility in using any type of gas whether it be reactive or inert (such as argon, neon, hydrogen, nitrogen, acetylene, and oxygen [4], [5], [11]- [14]) any type of metal/conductive target material for anode (Ti [4]- [6], [10], graphite [12], [13], CoPt [11], FeCo [3], and W [14]) and film thickness can easily be varied through the number of deposition shots [2]- [4], [10]- [14].…”

mentioning

confidence: 99%

Dense Plasma Focus Device Based High Growth Rate Room Temperature Synthesis of Nanostructured Zinc Oxide Thin Films

Tan

Mah

Rawat

2015

IEEE Trans. Plasma Sci.

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High-energy-density plasmas in plasma focus device are now routinely being used as nonconventional plasma nanotechnology tool with novel processing and deposition parameters which are not available in conventional lowtemperature plasma facilities. This paper reports the synthesis of multilayered polycrystalline intrinsic defects-free nanostructured zinc oxide (ZnO) thin film onto room-temperature silicon substrates at high growth rates using pulsed high-energy-density dense plasma focus device. The device was operated in pure oxygen environment and the ablation target used was a pure zinc rod fitted onto the anode top. Thin films of ZnO were deposited at room temperature using different numbers of dense plasma focus shots and at different distances from the anode top. The as-deposited ZnO showed the formation of polycrystalline hexagonal phase ZnO thin films with strong c-axis orientation. The scanning electron microscopy results showed either uniformly laid nanoparticles or cauliflower aggregates of nanoparticles on the surface of the thin-film samples with average nanoparticle size varying between 23.3 ± 6.1 and 69.7 ± 16.5 nm. The average thicknesses of the multilayered thin films were measured to be in a range of 1.06 ± 0.14 to about 2.82 ± 0.32 µm. The complete disappearance of deep level emission band in photoluminescence spectrum of ZnO thin-film sample deposited using 30 focus shots at deposition distance of 15 cm showed successful synthesis of high crystalline quality intrinsic defects-free as-deposited ZnO thin film. One of the key features of the ZnO thin-film synthesis using nonconventional plasma focus device is the very high average growth rate of about 0.1 µm/shot. At one plasma focus shot per minute operation, the average growth rate comes out to be 0.1 µm/min, which is either higher or comparable with commonly used ZnO deposition methods; but at 10 Hz operation extreme growth rates of about 60 µm/min could be achieved.Index Terms-c-axis orientation, dense plasma focus (DPF), high growth rate, multilayered, ZnO thin films.

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Deposition of diamond-like carbon film using dense plasma focus

Cited by 37 publications

References 22 publications

Carburizing of zirconium using a low energy Mather type plasma focus

Carburizing of zirconium using a low energy Mather type plasma focus

Deposition of Chromium Thin Films on Stainless Steel-304 Substrates Using a Low Energy Plasma Focus Device

Dense Plasma Focus Device Based High Growth Rate Room Temperature Synthesis of Nanostructured Zinc Oxide Thin Films

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