Design and properties analysis of multi-layer dielectric used in pulse compressor gratings

Kong, Weijin; Shen, Zicai; Shen, Jing; Shao, Jianda; Fan, Zhengxiu

doi:10.1016/j.ijleo.2005.02.005

Cited by 12 publications

(10 citation statements)

References 9 publications

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“…Reactive magnetron sputtering deposition processes have been used widely in the industry to produce various high-quality thin films. For example, they are known to be especially suitable for optical filter applications, [1][2][3][4][5][6][7][8][9] where high-yield formation of oxide thin films with complex stoichiometry ͑such as TiNbO x ͒ under strict control of film qualities is strongly required.…”

Section: Introductionmentioning

confidence: 99%

Molecular dynamics study on Ar ion bombardment effects in amorphous SiO2 deposition processes

Taguchi

Hamaguchi

2006

Journal of Applied Physics

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Argon ion bombardment effects on growing amorphous SiO 2 films during reactive sputtering deposition processes were examined based on molecular dynamics ͑MD͒ and Monte Carlo ͑MC͒ simulation techniques. The system we have considered here is a film that is subject to energetic Ar bombardment while it is formed by surface reactions of Si and O atoms separately supplied at low kinetic energies. It has been found that ͑1͒ Ar injections preferentially sputter O atoms from the surface over Si and ͑2͒ also have a compressing effect on the growing film during the deposition process. In other words, our MD/MC simulations have demonstrated at the atomic level that, with higher energy Ar injections, an amorphous SiO 2 film grown in a reactive sputtering deposition process is denser and more Si rich.

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Section: Introductionmentioning

confidence: 99%

Molecular dynamics study on Ar ion bombardment effects in amorphous SiO2 deposition processes

Taguchi

Hamaguchi

2006

Journal of Applied Physics

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“…1. 79 Its workflow can be decomposed as follows. (i) Pulse stretching: the low-energy, ultrashort pulse generating from oscillator is dispersed to long pulse by pulse stretcher.…”

Section: Cpa Systemmentioning

confidence: 99%

“…Its workflow can be decomposed to three steps: (i) pulse stretching, (ii) pulse amplification, and (iii) pulse compression. 79 to show the following performance. (i) High DE: the DE is an important evaluation indicator for PCGs.…”

Section: Pcgsmentioning

confidence: 99%

Review of pulse compression gratings for chirped pulse amplification system

et al. 2021

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The ultrashort, ultrahigh intensity pulse laser has been fully developed in past three decades. Chirped pulse amplification (CPA) system plays an important role in the generation of the ultrashort, ultrahigh intensity pulse laser. Pulse compression gratings (PCGs) are the key element of CPA system and determine the performance and lifetime of the whole system. We introduce the principle of CPA system and the performance requirements of PCGs. Then the development status of PCGs, including Au-coated grating, multilayer dielectric grating (MDG), and metal MDG, is fully reviewed. Finally, the development prospect of PCGs in the future is presented. Our study is helpful for comprehensive understanding of PCGs. © 2021 Society of Photo-Optical Instrumentation Engineers (SPIE)

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“…According to the design and fabrication of MDGs, the multi-layer dielectric thin film must provide high transmittance during holography exposure wavelength (413-nm), high reflectance at use wavelength (1053-nm) and sufficient manufacture tolerance latitude of the grating design. Here we give an example for a multi-layer dielectric thin film stack used for the MDGs, which is working at 1053-nm with TE mode and 51.2ºincident [9]. Considering the exposing wavelength is chosen to be 413.1-nm with TE mode and 17.8ºincident.…”

Section: Numerical Calculationmentioning

confidence: 99%

Rigorous coupled-wave analysis for the optical character of multi-layer dielectric thin film

et al. 2008

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The optical property of multi-layer dielectric thin film is determined by its operation on the more or less complete cancellation of the light reflected at the upper and lower of the multi-layer interface of the thin film. An enhanced, numerically stable transmittance matrix approach based on rigorous coupled-wave analysis (RCWA) is applied to the analysis of optical character for multi-layer dielectric thin film. A design of a thin film stack used in multi-lay dielectric grating was presented by using the method of RCWA. The numerical calculation shows that RCWA is a relatively straightforward and deterministic technique for analysis the optical property of multi-layer dielectric thin film.

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Design and properties analysis of multi-layer dielectric used in pulse compressor gratings

Cited by 12 publications

References 9 publications

Molecular dynamics study on Ar ion bombardment effects in amorphous SiO2 deposition processes

Molecular dynamics study on Ar ion bombardment effects in amorphous SiO2 deposition processes

Review of pulse compression gratings for chirped pulse amplification system

Rigorous coupled-wave analysis for the optical character of multi-layer dielectric thin film

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