Detection of negative ions in glow discharge mass spectrometry for analysis of solid specimens

Mass Spectrometry‐based Techniques for Direct Quantification of High Ionization Energy Elements in Solid Materials—challenges and Perspectives

“…Another principally different approach for high ionization energy elements detection in GDMS is the use of negative ionization mode (Canulescu et al, 2009; Canulescu et al, 2010). Similar to ICP‐MS (see Section V), only a minor fraction of GDMS studies are employing negative ionization.…”

“…The authors demonstrated a simpler background spectrum compared to positive ionization mode due to the absence of 19 F + and 1 H 3 16 O + overlap. In the following study of the same group, the possibility of qualitative depth profiling of fluorine in anodized tantala with a tantalum fluoride layer was considered (Canulescu et al, 2010). The detection of 19 F − and 181 Ta 16 O 2 19 F − was shown to be beneficial compared with the use of positive ionization mode.…”

“…A certain shortcoming of negative ionization is related to the restriction of the element range which can be effectively detected, compared to positive ionization mode. Only a limited number of elements are prone to the anion formation, resulting in extremely reduced sensitivites (Canulescu et al, 2010). So simultaneous multielement analysis becomes complicated.…”

Plasma profiling-time of flight mass spectrometry: considerations to exploit its analytical performance for materials characterization

“…The "Plasma Profiling Spectrometer (PP-TOFMS)" from Horiba Scientific (France) is the first commercial instrument based on a radiofrequency (rf) PGD source coupled to a TOFMS. 13,14 Final instrumental design of PP-TOFMS is based on two previous prototypes, 15,16 being the commercial version characterized by a blanking interface stage located after the skimmer cone, horizontal sample loading and the possibility to detect negative ions. 17 The blanking interface has been implemented with the purpose of filtering most intense ions within the plasma (e.g.…”

Depth Profile Analysis of Amorphous Silicon Thin Film Solar Cells by Pulsed Radiofrequency Glow Discharge Time of Flight Mass Spectrometry

“…Spectral interferences removal is crucial for the quantification of some important analytes, such as . In the last years, rf-PGD-TOFMS has been successfully tested and applied for the analysis of rather varied materials, such as polymers [10], ultra-low energy implants [11], fluorine-containing tantala layers [12], or even isotopically enriched pellets [13]. Concerning GD applications to photovoltaic materials, GD-OES and GD-MS have been employed, for example, for the analysis of aluminium doped ZnO films [14], boron implanted and solar grade silicon [15,16].…”