2001
DOI: 10.1541/ieejsmas.121.266
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Development of Plastic Injection Molding Using the LIGA Process

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Cited by 11 publications
(6 citation statements)
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“…Fabrication procedure A rectangle grating with a high aspect ratio can be fabricated by micro-fabrication technology, most eminently the submicron LIGA process method 20) using the nano imprint method 19) and the synchrotron radiation lithography. These are the fabrication methods for the grating with a comb-type reflective plate.…”
Section: 2mentioning
confidence: 99%
See 1 more Smart Citation
“…Fabrication procedure A rectangle grating with a high aspect ratio can be fabricated by micro-fabrication technology, most eminently the submicron LIGA process method 20) using the nano imprint method 19) and the synchrotron radiation lithography. These are the fabrication methods for the grating with a comb-type reflective plate.…”
Section: 2mentioning
confidence: 99%
“…These are the fabrication methods for the grating with a comb-type reflective plate. The submicron structure of an aspect ratio 75 (depth: 15µm, width: 0.2µm) was successfully made by the submicron LIGA process method 20) . The thickness of aluminum is made isotropic and coherently 0.029µm by sputtering on the surface of this rectangle grating.…”
Section: 2mentioning
confidence: 99%
“…A mother die is manufactured using Si micromachining, glass micromachining, and the Lithographie, Galvanoformung, Abformung (LIGA) process and electroforming molds are then produced from the mother die [14,15]. Microstructures having high aspect ratios are produced using deep reactive ion etching [16] and the LIGA process.…”
Section: Introductionmentioning
confidence: 99%
“…Injection molding and imprinting techniques are the typical fabrication methods of polymeric microfluidic devices (11)(12)(13). A mother die for these techniques is still expensive because the mother die is fabricated by using dry etching process or LIGA process (14)(15)(16). One of the solutions to prepare a low-cost mother die with high precision is using a photoresist as a master pattern and electroforming.…”
Section: Introductionmentioning
confidence: 99%