2018
DOI: 10.1364/ome.8.000175
|View full text |Cite
|
Sign up to set email alerts
|

Development of tuned refractive-index nanocomposites to fabricate nanoimprinted optical devices

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
4
1

Citation Types

0
13
0

Year Published

2019
2019
2022
2022

Publication Types

Select...
9
1

Relationship

1
9

Authors

Journals

citations
Cited by 16 publications
(13 citation statements)
references
References 32 publications
0
13
0
Order By: Relevance
“…Thus, one can improve Q , for a given resonance position, λ r , by lowering the modulation index. One could attempt to lower the modulation index by selecting two different grating materials that are closer in permittivity values or by creating nano-composites [45]. However, this introduces additional steps to the process flow and may require additional tools and testing.…”
Section: Methodsmentioning
confidence: 99%
“…Thus, one can improve Q , for a given resonance position, λ r , by lowering the modulation index. One could attempt to lower the modulation index by selecting two different grating materials that are closer in permittivity values or by creating nano-composites [45]. However, this introduces additional steps to the process flow and may require additional tools and testing.…”
Section: Methodsmentioning
confidence: 99%
“…The optical adhesive Norland Optical Adhesive 73 (NOA73) with a refractive index of 1.56 is chosen as the material for our grating structure. NOA73 is a flexible material that exhibits low shrinkage and cures to a solid under UV light [22] , so the fabrication process is not only simplified by nanoimprint lithography, but also mass production is possible. A device with a DC structure was fabricated in this way by Hemmati et al in 2019 [21] .…”
Section: Introductionmentioning
confidence: 99%
“…Other techniques such as interference lithography (IL) or extreme ultraviolet lithography (EUVL) are available for large area patterning, but at the same time require high equipment investment costs and oftentimes multiple exposure steps to obtain two-dimensional greyscale patterns [38,39]. On the other hand, nanoimprint lithography (NIL) is a low-cost process allowing for high-throughput reproduction of multiscale patterns [40][41][42][43]. However, the obtainable nanopatterns are essentially restricted to the geometrical shape and dimensions of the imprint template [44,45].…”
Section: Introductionmentioning
confidence: 99%