Diamond-like amorphous carbon films prepared by r.f. sputtering in argon

Ullmann, J.; Schmidt, G.; Scharff, W.

doi:10.1016/0040-6090(92)90452-h

Cited by 15 publications

(1 citation statement)

References 19 publications

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“…The unique physical, chemical and mechanical properties of diamond make it attractive for many applications such as wear resistant coatings, cutting tools, and heat spreaders for electronic devices. Several methods are used successfully to produce diamond films such as hot filament chemical vapor deposition (CVD) [ 1 ], electron assisted CVD [ 2 ], dc discharge CVD [ 3 ], RF discharge CVD [ 4 ], microwave plasma-assisted CVD [ 5 ], and laser-assisted deposition [ 6 ]. Almost all these approaches employ feed gases that are constantly being replenished.…”

Section: Introductionmentioning

confidence: 99%

Deposition of Diamond Films in A Closed Hot Filament Cvd System

Lai

Farabaugh

Feldman

et al. 1995

J. Res. Natl. Inst. Stand. Technol.

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A closed system hot filament chemical vapor deposition (CVD) reactor has been used to deposit diamond films on silicon substrates. A fixed charge of hydrogen gas is fed into the deposition system until the desired deposition pressure level is reached. A solid graphite cylindrical rod held above the tungsten filament was the carbon source. System parameters for diamond film growth have been determined. The diamond structure of the films has been verified by x-ray diffraction (XRD). Morphology typical of CVD diamond films has been observed in scanning electron microscopy (SEM). The quality of the diamond films has been evaluated by micro-Raman spectroscopy.

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