High-effciency GaP green light-emitting p-n junctions have been reproducibly grown employing an overcompensation technique in a vertical dipping LPE system. In this technique b~th the n-and p-type layers are grown in a single LPE crystal growth run, eliminating potential interface problems at the junction. For junction material grown at an initial temperature of 900~ the EL quantum effciencies of encapsulated mesa diodes ranged from 0.08 to 0.14% and averaged 0.10% at 5 mA (,~5-10 A/cm2). Minority carrier diffusion lengths (L~Lh) and relative cathode-luminescence efficiency (CL) were measured in a scanning electron microscope. At excitation levels equivalent to current densities of ,~1-10 A/cm2 in a p-n junction, both Le and Z,h range from 3 to 5~ with maximum measured values of Lh = 7.2# and Le --5.6/~ for material grown from 900~ At the same excitation level the CL efficiency of the p-layers was typically found to be approximately 2-3 times that of the n-layers. Typical values for Le, Lh, CL, and the EL effciencies were found to be larger by --,50% for material grown from 900~ compared to similarly grown material from 1000~The major assets of the overcompensation technique are the high degree of reproducibility in obtaining high effciencies and that only a single growth process is necessary to form the p~ junction.