Direct-scatterometry-enabled lithography model calibration

Scatterometry is a well-established, fast and precise optical metrology method used for the characterization of sub-lambda periodic features. The Fourier scatterometry method, by analyzing the Fourier plane, makes it possible to collect the angle-resolved diffraction spectrum without any mechanical scanning. To improve the depth sensitivity of this method, we combine it with white light interferometry. We show the exemplary application of the method on a silicon line grating. To characterize the sub-lambda features of the grating structures, we apply a model-based reconstruction approach by comparing simulated and measured spectra. All simulations are based on the rigorous coupled-wave analysis method.

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Solving the inverse grating problem by white light interference Fourier scatterometry

Paz

Peterhänsel

Frenner

et al. 2012

Light Sci Appl

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Direct-scatterometry-enabled lithography model calibration

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Solving the inverse grating problem by white light interference Fourier scatterometry

Solving the inverse grating problem by white light interference Fourier scatterometry

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