1996
DOI: 10.1116/1.580211
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Effect of a vacuum ion gauge on the contamination of a hydrogen-passivated silicon surface

Abstract: The effect of operating a vacuum ion gauge on carbonaceous (C) contamination of a hydrogen (H)-passivated Si surface before epitaxial growth was investigated. The dependence of C contamination on the residence time in the loading chamber, tlc, was determined with or without operating a vacuum ion gauge. The results showed that C contamination of a H-passivated surface was greatly increased by use of the ion gauge. With ion gauge operation in a vacuum of 1×10−6–1×10−7 Torr in the loading chamber, the configurat… Show more

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Cited by 4 publications
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“…The scattering chamber is equipped with an ion gauge and mass spectrometer for measuring the chamber pressure and sample reflectivity respectively. These were not used during the experiment, to avoid the possibility of surface degradation from the ionizing filaments [15]. After measurements had been completed, the scattering chamber pressure and the helium reflectivity were measured.…”
Section: Methodsmentioning
confidence: 99%
“…The scattering chamber is equipped with an ion gauge and mass spectrometer for measuring the chamber pressure and sample reflectivity respectively. These were not used during the experiment, to avoid the possibility of surface degradation from the ionizing filaments [15]. After measurements had been completed, the scattering chamber pressure and the helium reflectivity were measured.…”
Section: Methodsmentioning
confidence: 99%