Si(111)–H(1×1): A mirror for atoms characterized by AFM, STM, He and H2 diffraction

A high-reflectivity atom-focusing mirror stable at room temperature

“…Under these conditions, 15% of the incoming beam intensity is scattered into the specular peak. This is a factor of ϳ20 times higher than for Si͑111͒-H͑1 ϫ 1͒ passivated surfaces under similar scattering conditions, 16 and comparable with the reflectivity of the QSE-stabilized Pb thin films on Si͑111͒. 8 However, and in contrast to the latter-which are stable only at surface temperatures below 250 K-Pb͑ͱ3 ϫ ͱ 3͒R30 surfaces are stable up to 450 K, which is a great advantage for application purposes.…”

Linewidths in bound state resonances for helium scattering from Si(111)–(1 × 1)H

“…The surface was hydrogen-passivated using a recently developed procedure [10], consisting of alternating stages of oxidation/cleaning in dilute piranha solution (a mixture of sulphuric acid and hydrogen peroxide) and oxide removal in hydrofluoric acid. A final etch in ammonium fluoride was used to smooth, flatten and hydrogen-terminate the surface.…”

Helium reflectivity and Debye temperature of graphene grown epitaxially on Ru(0001)

“…The specular absolute reflectivity is 20%, which is a factor of ∼20 times higher than for the H-passivated Si(111) surface under similar scattering conditions. 11 Likewise, an 11% reflectivity was obtained for a H 2 beam scattered off MLG/Ru(0001), whereas to date the highest H 2 reflectivity reported for H 2 beams was 2.6% in the case of Si(111)-H(1 × 1). 11 An intense and focused beam of hydrogen might be a promising tool for lithography in wafer-scale fabrication of molecular junctions.…”

“…11 Likewise, an 11% reflectivity was obtained for a H 2 beam scattered off MLG/Ru(0001), whereas to date the highest H 2 reflectivity reported for H 2 beams was 2.6% in the case of Si(111)-H(1 × 1). 11 An intense and focused beam of hydrogen might be a promising tool for lithography in wafer-scale fabrication of molecular junctions. scattering process occurs at ∼3Å away from the topmost atom cores of the solid´s surface.…”

“…10 Present prototypes of the SHeAM use a hydrogen-passivated Si(111)-(1 × 1) mirror, which exhibits a reflectivity of ∼1% for He atoms. 11 Such a low intensity of the focused beam limits the present lateral resolution of the SHeAM to about 230 μm, 12 although in principle it could be reduced to 50 nm if a larger beam intensity were available. Therefore, the realization of a more efficient mirror for SHeAM has hitherto been a grand challenge.…”