Effect of DC input power and nitrogen ratio on the deposition of Ti 1−x Al x N thin films using high power impulse magnetron sputtering technique

Wu, Wan-Yu; Su, Amei; Liu, Yawei; Yeh, Chi-Ming; Chen, Wei-Chih; Chang, Chi-Lung

doi:10.1016/j.surfcoat.2016.03.050

Cited by 12 publications

(4 citation statements)

References 42 publications

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“…Another discovery equally claimed our attention in that there was no crystal diffraction peak corresponding to Si element. The reason for this phenomenon may be that Si can substitute Al/Ti at cation lattice sites of the B1-NaCl lattice when the concentration of Si is less than 5 at.%-6 at.% in TiSiN and TiAlSiN coatings, which was verified by other previous studies [18,19]. The XRD peak (200) of TiAlSiN coatings pre-implanted with N and O shifted slightly towards a higher angle, implying a decrease in the lattice parameter because of incorporation of other atoms whose radii were smaller than those of the existing atoms [20]; or possibly this shift may be attributed to lattice distortion caused by high energy particle (N + , O + , Ar + ) bombardment.…”

Section: Microstructure Of As-deposited Coatingssupporting

confidence: 71%

Improved Adhesion of TiAlSiN Nanocomposite Coatings on Cemented Carbide Substrate by Pre-Implantation

Wang

et al. 2019

Coatings

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TiAlSiN coatings were deposited on YT 15 cemented carbide substrate by reactive direct current magnetron sputtering (DCMS) in a Plasma Immersion Ion Implantation and Deposition (PIII&D) system. The pre-implantation step and the coating deposition were carried out in the same experimental facility. In this article the effects of pre-implantation of several different elements (N, C, and O) were investigated. The adhesion strength, hardness, micro-structure, element concentration, depth profile, and the formation of coatings after the PIII experiments were characterized by a wide variety of techniques such as Rockwell indentation, scratch test, nano-indentation measurement, X-ray diffraction, energy dispersive spectroscopy, and Auger electron spectroscopy. The results showed that the adhesive strength of TiAlSiN coatings was significantly improved on samples pre-implanted with N and O whereas only slightly improved with pre-implantation of C. Additionally, the microstructure and mechanical properties of the TiAlSiN coatings were also altered through pre-implantation. The improved adhesion could be explained by the grain refinement and surface energy enhancement of the substrate by pre-implantation.

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Section: Microstructure Of As-deposited Coatingssupporting

confidence: 71%

Improved Adhesion of TiAlSiN Nanocomposite Coatings on Cemented Carbide Substrate by Pre-Implantation

Wang

et al. 2019

Coatings

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“…Wu et al [76] deposited Ti 1−x Al x N thin films (x varied from 0.72-0.86) using the HiPIMS technique. The influence of the pulse power and N 2 /Ar ratio on the microstructure and hardness was studied.…”

Section: Hard Coatingsmentioning

confidence: 99%

High power impulse magnetron sputtering and its applications

Yang

Liu

Chen

2018

Plasma Sci. Technol.

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High power impulse magnetron sputtering (HiPIMS) has attracted a great deal of attention because the sputtered material is highly ionized during the coating process, which has been demonstrated to be advantageous for better quality coating. Therefore, the mechanism of the HiPIMS technique has recently been investigated. In this paper, the current knowledge of HiPIMS is described. We focus on the mechanical properties of the deposited thin film in the latest applications, including hard coatings, adhesion enhancement, tribological performance, and corrosion protection layers. A description of the electrical, optical, photocatalytic, and functional coating applications are presented. The prospects for HiPIMS are also discussed in this work.

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“…The duty cycle is one important factor for the process stability. When the duty cycle is getting too low, arcing takes place, which can have a negative influence on the coating process [4]. One approach to overcome this problem is the use of plasma diagnostics like optical emission spectroscopy (OES).…”

Section: Introductionmentioning

confidence: 99%

Prediction of OES intensity ratios based on coating unit data in HPPMS processes by ANN

Bobzin

Kalscheuer

Möbius

et al. 2023

J. Phys. D: Appl. Phys.

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High Power Pulse Magnetron Sputtering (HPPMS) processes are characterized by high peak powers and peak voltages. This results in a high fraction of ionized metal ions within the coating plasma. In order to analyze the correlations between parameters of the coating unit and the intensities of the excited and ionized plasma species, optical emission spectroscopy (OES) can be used. In those experiments, several process parameters are varied in a single coating process. Currently, the prediction of plasma parameters based on coating unit data follows deterministic models which cannot describe the complexity in total. Therefore, not all correlations can be fully understood. Artificial neural networks (ANN) can be used to identify correlations between process parameters and plasma species. This enables prediction of OES data based on data of the coating machine. In the present study different coating processes containing the elements Al, Cr, Ti, N and O were investigated. Current and voltages of the cathodes, substrate bias, chamber pressure, gas flows and the target compositions were used as input parameter of the ANN. Time resolved OES data of metal and gas species were used as output data. To determine the most appropriate training algorithm for the current predictions, multiple algorithms were employed. A good prediction accuracy of OES intensity ratios based on coating unit data for industrial scale coating processes for TiAlN was obtained. For CrAlON the prediction of the intensity ratios of the gas species showed good results. Nowadays a high amount of coating machine parameter variations in PVD processes is needed in order to achieve tailored coating parameters. By using plasma diagnostics, such as OES, cost intensive coating deposition processes can be reduced significantly. A further shortening of process development time is possible by using ANN, since plasma compositions can be determined based on coating unit data.

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Effect of DC input power and nitrogen ratio on the deposition of Ti 1−x Al x N thin films using high power impulse magnetron sputtering technique

Cited by 12 publications

References 42 publications

Improved Adhesion of TiAlSiN Nanocomposite Coatings on Cemented Carbide Substrate by Pre-Implantation

Improved Adhesion of TiAlSiN Nanocomposite Coatings on Cemented Carbide Substrate by Pre-Implantation

High power impulse magnetron sputtering and its applications

Prediction of OES intensity ratios based on coating unit data in HPPMS processes by ANN

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