Silicon carbide (SiC) attracts extensive attention due to its attractive properties, such as a large bandgap, excellent chemical stability, high-temperature stability, and resistance to heat, radiation, corrosion, and thermal shock. [1][2][3][4][5][6] Thus, it is widely used within functional and structural materials in high temperature, aerospace, nuclear energy, and other applications. [5][6][7][8][9] Chemical vapor deposition (CVD) and infiltration (CVI) are among the most feasible and widely studied SiC fabrication approaches because of their ability to handle complex geometry, flexible processing conditions, and the high purity, high density, and excellent crystalline morphology of the prepared SiC. [10][11][12][13][14][15][16][17][18][19][20] Methyltrichlorosilane (CH 3 SiCl 3 , MTS) is the most commonly used gas precursor for CVD and CVI of SiC [15][16][17][18][21][22][23][24] owing to its equivalent ratio of silicon (Si) to carbon (C) and the wide range of allowable deposition temperatures. Hydrogen (H 2 ) is frequently used as the carrier and diluent gas with MTS, both delivering the MTS precursor to the reactor and regulating the concentration of mixed gas precursors. 12