Effect of oxide thickness on the degradation of organic silane monolayers on silicon wafer surface during XPS measurement

Sato, Masahide; Furusawa, Takeshi; Hotta, Takahide; Watanabe, Haruyuki; Suzuki, Noboru

doi:10.1002/sia.2238

Cited by 14 publications

(17 citation statements)

References 15 publications

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“…Figure 4shows the change in the particular peaks of CPTES-Si, BPTMS-Si and PFDT-Au with time. The intensity of the Cl 2p peak of CPTES-Si, the Br 3d peak of BPTMS-Si and the F 1s peak of PFDT-Au decreases within the measurement cycles as shown in other studies[18]. These results imply that all prepared organic silane monolayers on silicon wafer were damaged during XPS measurement.…”

supporting

confidence: 76%

“…It is well known that the surface damages have been observed during XPS measurement for many organic materials, such as polymers [1][2][3][4][5][6][7][8][9][10][11], Langmuir-Blodgett films [12][13][14], and organosilane [15][16][17][18] and alkanethiol [18][19] monolayers on solid substrates. Factors for the surface damage are considered to be X-ray irradiation, heat radiation from filament, photoelectrons generated from the sample itself, and so on.…”

Section: Introductionmentioning

confidence: 99%

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Degradation of organic silane monolayers on silicon wafer during XPS measurement

Yamato

Nihei

Kawamura

et al. 2014

JSA

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The degradation of organic materials was often observed during XPS measurement. We have evaluated the degradation of silicon wafers modified with 3,3,3-trifluoropropyltrimethoxysilane (F3PTMS-Si), 3-chloropropyltriethoxysilane (CPTES-Si), 3-bromopropyltrimethoxysilane (BPTMS-Si) and 3-iodopropyltrimethoxysilane (IPTMS-Si), and gold substrate modified with 1H,1H,2H,2H-perfluorodecanthiol (PFDT-Au) as reference material in order to investigate influence of C-F, C-Cl, C-Br and C-I bonds in the organic silane monolayers. As a result, the order of damaging factor, β, was IPTMS-Si > BPTMS-Si > CPTES-Si > F3PTMS-Si. It was found that the value of β was related to the chemical bond energy of C-X(X=F, Cl, Br, I).

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supporting

confidence: 76%

Section: Introductionmentioning

confidence: 99%

Degradation of organic silane monolayers on silicon wafer during XPS measurement

Yamato

Nihei

Kawamura

et al. 2014

JSA

Self Cite

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“…Dosage can in principle be calculated from literature mass attenuation coefficients, 21 but the calculation of absolute X-ray dosage is difficult for this type of experimental setup and for such thin film samples. One approach to quantify dosage in this type of setups was developed by Suzuki et al [22][23][24] using the xps intensity of a standard sample (Ag 3d5/2 ) to obtain a relative dose from which an "apparatus damaging factor" can be obtained with units of cps −1 eV −1 s −1 . Instead, we have used the mass attenuation coefficients and the photoelectron yield to estimate the absolute X-ray dosage on the Nafion film.…”

Section: Methodsmentioning

confidence: 99%

Chemical and Ionic Conductivity Degradation of Ultra-Thin Ionomer Film by X-ray Beam Exposure

Paul

Giorgi

Karan

2013

J. Electrochem. Soc.

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X-ray based techniques have been adopted as a diagnostic tool for both ex-situ and in-situ material characterization techniques in PEMFC. Possible damage of Nafion due to X-ray irradiation is a concern especially for thin films. To investigate the X-ray irradiation effect on ultra-thin Nafion film structure and properties, supported 10 nm films were prepared on SiO 2 /Si substrate with inter-digitated gold arrays (IDA) and exposed to X-ray radiation at three X-ray power sources: 300, 200 and 100 W for 45 mins. Proton conductivity of each film was measured by electrochemical impedance spectroscopy before and after X-ray exposure. We determine that X-ray radiation damages the polymer by preferential removal of sulfur species from the film that results in a clear loss of proton conductivity. Damage by 300, 200, and 100 W radiation over 45 minutes removes 78, 74 and 54% of the sulfur present, respectively, yielding a loss of 99, 97 and 95% in the proton conductivity of the film. It is suggested that Nafion degradation takes place by not only the removal of the sulfonic group, but also by the removal of a fraction of fluorine consistent with cleavage at the ether group of its side chain.

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“…20 This method has been shown to produce a thin homogenous CTMS layer (Figure 1b The standard (1 µg cm -3 ) Be (II) ion solution was prepared from anhydrous beryllium chloride (Sigma-Aldrich) in 0.01 M HCl solution, as described previously. 9 Aliquots of this standard solution were used to make the sample solution in a 25 cm -3 volumetric flask, with 5 cm -3 0.01 M disodium EDTA solution, Figure 2.…”

Section: Methodsmentioning

confidence: 99%

Nanopillar Based Enhanced-Fluorescence Detection of Surface-Immobilized Beryllium

et al. 2015

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The unique properties associated with beryllium metal ensures the continued use in many industries despite the documented health and environmental risks. While engineered safeguards and personal protective equipment can reduce risks associated with working with the metal, it has been mandated by the Environmental Protection Agency (EPA) and Occupational Safety and Health Administration (OSHA) that the workplace air and surfaces must be monitored for toxic levels. While many methods have been developed to monitor levels down to the low μg/m(3), the complexity and expense of these methods have driven the investigation into alternate methodologies. Herein, we use a combination of the previously developed fluorescence Be(II) ion detection reagent, 10-hydroxybenzo[h]quinoline (HBQ), with an optical field enhanced silicon nanopillar array, creating a new surface immobilized (si-HBQ) platform. The si-HBQ platform allows the positive control of the reagent for demonstrated reusability and a pillar diameter based tunable enhancement. Furthermore, native silicon nanopillars are overcoated with thin layers of porous silicon oxide to develop an analytical platform capable of a 0.0006 μg/L limit of detection (LOD) using sub-μL sample volumes. Additionally, we demonstrate a method to multiplex the introduction of the sample to the platform, with minimal 5.2% relative standard deviation (RSD) at 0.1 μg/L, to accommodate the potentially large number of samples needed to maintain industrial compliance. The minimal sample and reagent volumes and lack of complex and highly specific instrumentation, as well as positive control and reusability of traditionally consumable reagents, create a platform that is accessible and economically advantageous.

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Effect of oxide thickness on the degradation of organic silane monolayers on silicon wafer surface during XPS measurement

Cited by 14 publications

References 15 publications

Degradation of organic silane monolayers on silicon wafer during XPS measurement

Degradation of organic silane monolayers on silicon wafer during XPS measurement

Chemical and Ionic Conductivity Degradation of Ultra-Thin Ionomer Film by X-ray Beam Exposure

Nanopillar Based Enhanced-Fluorescence Detection of Surface-Immobilized Beryllium

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