1993
DOI: 10.1007/bf03054179
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Electrical and optical properties of polycrystalline Ag-doped CdS thin films

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Cited by 4 publications
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“…At the same time, high-temperature or high-energy methods of obtaining thin films of complex semiconductors, such as electron beam sputtering, cathode sputtering, sputtering followed by pyrolysis, the method of gas transport reactions, liquid phase epitaxy, and others cannot guarantee the preservation of the integrity of the molecule, and therefore for production of thin OS films is rarely used. Recently, the Langmuir-Blodgett method has been widely used to apply very thin OS layers, including monomolecular ones (Luo et al, 1992;Khalid & Jassem, 1993). Thin films of OS, especially metallophthalocyanines, are obtained by the method of deposition (epitaxy) from molecular beams of organic compounds (Tada et al, 1992;Maruno et al, 1993), but due to the high cost of the equipment, this method was not widely used.…”
Section: Introductionmentioning
confidence: 99%
“…At the same time, high-temperature or high-energy methods of obtaining thin films of complex semiconductors, such as electron beam sputtering, cathode sputtering, sputtering followed by pyrolysis, the method of gas transport reactions, liquid phase epitaxy, and others cannot guarantee the preservation of the integrity of the molecule, and therefore for production of thin OS films is rarely used. Recently, the Langmuir-Blodgett method has been widely used to apply very thin OS layers, including monomolecular ones (Luo et al, 1992;Khalid & Jassem, 1993). Thin films of OS, especially metallophthalocyanines, are obtained by the method of deposition (epitaxy) from molecular beams of organic compounds (Tada et al, 1992;Maruno et al, 1993), but due to the high cost of the equipment, this method was not widely used.…”
Section: Introductionmentioning
confidence: 99%