1998
DOI: 10.1007/bf02927563
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Electrical and optical properties of rf-sputtered CdTe films

Abstract: In this paper some electrical and optical pr~perties of n-type CdTe films prepared by rf sputtering at I80 W power have been reported, For daping the films a number of pellets of pure Cd placed on the CdTe target were shnultaneously sputtered with the target material to get Cd-doped CdTe films. The films after doping were found n-type, l~Iaximnrn doping concentration obtained this way was of the order of 1014 t~n-3. XR[? spectra of target material and the rf-sputtered films were found to he more or less simUar… Show more

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Cited by 7 publications
(3 citation statements)
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“…The details of this experimental arrangement have been discussed elsewhere [15]. A Keithley system electrometer (Model 6514) was used to measure the current in dark and under illumination.…”
Section: Methodsmentioning
confidence: 99%
“…The details of this experimental arrangement have been discussed elsewhere [15]. A Keithley system electrometer (Model 6514) was used to measure the current in dark and under illumination.…”
Section: Methodsmentioning
confidence: 99%
“…The J-V curves were drawn with the help of X-Y recorder (Digital Electronics Ltd.). Details of experimental arrangement and measurement have been reported in our earlier paper (Sarmah and Rahman 1998).…”
Section: Methodsmentioning
confidence: 99%
“…The RF magnetron sputtering permits deposition at low temperature, and gives better adhesion, larger coverage and higher film density than other methods. The main advantage of RF magnetron sputtering is that the stoichiometry of the sputtering material is retained in the deposited film making it a suitable technique for depositing intermetallic compounds [19]. Another advantage of the sputtering technique is the use of low energy particle bombardment for achieving lower growth temperatures along with the use of excited species for improving the doping control during growth [20].…”
Section: Introductionmentioning
confidence: 99%