Energy distributions of neutral atoms sputtered by very low energy heavy ions

Brizzolara, Robert A.; Cooper, Christopher B.; Olson, T.

doi:10.1016/0168-583x(88)90095-x

Cited by 46 publications

(19 citation statements)

References 8 publications

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“…These observations are in general agreement with experimental and theoretical findings by Brizzolara et al, 25 Dembovsky et al, 19 and Yamamura and Ishida, 26 respectively. These observations are in general agreement with experimental and theoretical findings by Brizzolara et al, 25 Dembovsky et al, 19 and Yamamura and Ishida, 26 respectively.…”

Section: A Energy Of Sputtered Atomssupporting

confidence: 92%

Energy transfer into the growing film during sputter deposition: An investigation by calorimetric measurements and Monte Carlo simulations

Drüsedau

Bock

John

et al. 1999

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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Experiment and simulation of the compositional evolution of Ti-B thin films deposited by sputtering of a compound target Radio frequency magnetron sputtering deposition of calcium phosphate coatings: Monte Carlo simulations of the deposition process and depositions through an apertureThe power density at the substrate during sputter deposition was measured by a calorimetric method. In combination with measurements of the atomic deposition rate, the total amount of the energy input per incorporated atom was determined. The measured values range from 18 eV for aluminum to about 1000 eV maximum per atom for carbon. There is, for all elements investigated, a general trend for a linear increase of the energy per atom with increasing sputtering argon pressure over the range from 0.2 to 7 Pa. The energy per atom decreases with increasing power of the sputtering discharge. The application of a negative bias to the substrate reduces the total energy per atom to the values measured at low pressure of 0.4 Pa or below. The total energy flux in the low pressure range ͑0.4 Pa or less͒ can be well described by contributions due to plasma irradiation, the heat of condensation of the deposited atoms, their kinetic energy, and the kinetic energy of the reflected argon neutrals. The latter two components are a priori calculated by TRIM.SP Monte Carlo simulations. There is good agreement between the a priori calculated and the measured values. The combination of experimental and theoretical data result in empirical rules for the energies of the sputtered and reflected species, which allow an estimate of the energy input during sputter deposition for every elemental target material in the low pressure range. In a first approximation, the energy per incorporated atom is proportional to the ratio between target atomic mass and sputtering yield.

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Section: A Energy Of Sputtered Atomssupporting

confidence: 92%

Energy transfer into the growing film during sputter deposition: An investigation by calorimetric measurements and Monte Carlo simulations

Drüsedau

Bock

John

et al. 1999

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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“…( 25). This deviation of the energy distribution from the E −2 for low impact energies has been observed experimentally (e.g., Brizzolara et al 1988;Goehlich et al 2000).…”

Section: The Velocity Distribution Of Sputtered Particlessupporting

confidence: 73%

Particles and Photons as Drivers for Particle Release from the Surfaces of the Moon and Mercury

et al. 2022

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The Moon and Mercury are airless bodies, thus they are directly exposed to the ambient plasma (ions and electrons), to photons mostly from the Sun from infrared range all the way to X-rays, and to meteoroid fluxes. Direct exposure to these exogenic sources has important consequences for the formation and evolution of planetary surfaces, including altering their chemical makeup and optical properties, and generating neutral gas exosphere. The formation of a thin atmosphere, more specifically a surface bound exosphere, the relevant physical processes for the particle release, particle loss, and the drivers behind these processes are discussed in this review.

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“…This is close to the value observed in sputtering induced by Ar+ ions [13); however, the high energy portion of the spectrum remains significantly harder than 1/E2.…”

Section: Sputtered Atom Energy Distributionssupporting

confidence: 50%

Molecular Dynamics Simulations of Cluster Impacts on Metallic Targets

Shapiro

Tombrello

1990

MRS Proc.

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A modified version of the multiple-interaction code SPUT2 has been used to simulate impacts of 63-atom Cu clusters on six-layer Cu targets.Simulations were carried out with cutoff times of 100 and 500 fs for an incident cluster energy of 63 keV (1 keV/atom).Significant enhancements were observed in the maximum potential and kinetic energies achieved in the early phase of the collision cascade.Some hard collisions yielded atoms with potential energies as high as 92 5 eV (in the CM frame) This is almost twice the energy allowed in an isolated two-body collision.The number of hard collisions per time-step vs potential energy is well-fitted with a decaying exponential, allowing extrapolation to higher energies.These results together with similar results for Al clusters impacting Au targets suggest that non-linear collisional effects cannot explain the high D-D fusion rates seen in Beuhler, Friedlander, and Friedman's recent experiment [l].

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Energy distributions of neutral atoms sputtered by very low energy heavy ions

Cited by 46 publications

References 8 publications

Energy transfer into the growing film during sputter deposition: An investigation by calorimetric measurements and Monte Carlo simulations

Energy transfer into the growing film during sputter deposition: An investigation by calorimetric measurements and Monte Carlo simulations

Particles and Photons as Drivers for Particle Release from the Surfaces of the Moon and Mercury

Molecular Dynamics Simulations of Cluster Impacts on Metallic Targets

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