Spin-dependent tunnel junctions with ZrAlO x barriers were fabricated with low resistanceϫarea product 4 ⍀ϫ m 2 , and tunnel magnetoresistance of 15.2%. Barrier fabrication was done by natural oxidation ͑5 min, at oxidation pressures ranging from 0.5 to 10 Torr͒. The junctions were deposited on top of 600 Å thick, ion beam smoothed, low resistance, Al electrodes. X-ray photoelectron spectroscopy analysis indicates the presence of AlO x , ZrO 2 , some remnant metallic Zr, but no metallic Al in the as-deposited barriers. High resolution transmission electron microscopy indicates that ZrAlO x forms an amorphous barrier that is smoother than pure crystalline ZrO x or pure amorphous AlO x barriers. These low resistance tunnel junctions are attractive for read head applications above 100 Gbit/in 2 where competitive signal to noise ratios imply resistanceϫarea product below a few ⍀ϫ m 2 , and tunneling magnetoresonance signals near or above 20%.