Evidence of the filling of nano-porosity in SiO2-like layers by an initiated-CVD monomer

The impact of the nano-pore filling on the performance of organosilicon-based moisture barriers

“…3a, the i-CVD process is monitored: while setting the process pressure value, an uptake of the optical thickness is observed due to V 3 D 3 adsorption in the open nano-porosity, as we have already reported in Ref. [31]. The diameter of the V 3 D 3 molecule allows it to infiltrate in pores with a size ≥ 1 nm.…”

“…All the layers were deposited without breaking the vacuum in a custom-built setup which allows for thin film deposition by means of both PE-CVD and i-CVD approaches [31,37]. The wire system for i-CVD is mounted on a magnetic movable arm, and during the i-CVD process it is inserted into the deposition chamber at a distance of 2 cm from the substrate holder.…”

“…Eventually, this infiltration is expected to influence the local water permeation through the filled pores. Recently [31], we reported on the experimental evidence for the infiltration of an i-CVD monomer into the nano-pores (from 1 to 2 nm in pore size) of single PE-CVD SiO 2 barrier layers during the initial stages of the polymerization process. These studies confirmed that the hypothesis of Affinito et al [26] also applies for a CVD-based process.…”

Using hot wire and initiated chemical vapor deposition for gas barrier thin film encapsulation

“…iCVD allows for the deposition of films with nanoscale thicknesses with macroscale uniformity, making it very well suited to deposit such interlayers [16]. Using iCVD to deposit the interlayers brings additional barrier enhancement: It was shown by Aresta et al [17], that in case nanopores are present in the inorganic material, deposited iCVD layers are very effective in filling them, as it is schematically depicted in Fig. 4(c).…”

“…The rms roughness of an Asahi substrate was reduced from 42.3 nm to 14.3 nm with a planarizing PGMA layer of 335 nm [21]. c) Schematic representation of the filling of nanopores in the inorganic layer by monomers and the subsequent polymerization in the iCVD process [17]. Fig.…”