2007 Digest of Papers Microprocesses and Nanotechnology 2007
DOI: 10.1109/imnc.2007.4456218
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Fabrication of Glassy Carbon Molds Using Hydrogen Silsequioxane Patterned by Electron Beam Lithography as O2 Dry Etching Mask

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Cited by 3 publications
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“…Then, these microholes were imprinted on glass followed by the transformation into an MLA using the thermal reflow of the glass. Yasui et al [ 113 ] proposed combining electron beam writing with plasma-coupled RIE to fabricate line and space patterns with a depth of 300 nm on the surface of GC. Then, these grating patterns were transcribed to Pyrex glass using hot embossing.…”
Section: Mold Materials For Precision Glass Moldingmentioning
confidence: 99%
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“…Then, these microholes were imprinted on glass followed by the transformation into an MLA using the thermal reflow of the glass. Yasui et al [ 113 ] proposed combining electron beam writing with plasma-coupled RIE to fabricate line and space patterns with a depth of 300 nm on the surface of GC. Then, these grating patterns were transcribed to Pyrex glass using hot embossing.…”
Section: Mold Materials For Precision Glass Moldingmentioning
confidence: 99%
“…Examples of micro/nano glass molding using GC molds are summarized in Table S5 of the Supplementary Material [ 23 , 105 , 106 , 107 , 108 , 109 , 110 , 111 , 112 , 113 , 114 , 116 , 117 , 119 , 120 , 121 , 122 , 123 , 124 , 125 , 126 , 127 , 128 , 129 , 130 ]. There are approaches available to fabricate GC molds.…”
Section: Mold Materials For Precision Glass Moldingmentioning
confidence: 99%