Fabrication of Large Area Periodic Nanostructures Using Nanosphere Photolithography

Wu, Wei; Dey, Dibyendu; Memiş, Ömer Gökalp; Katsnelson, A.; Mohseni, Hooman

doi:10.1007/s11671-008-9164-y

Cited by 59 publications

(42 citation statements)

References 6 publications

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“…We use self-assembled polystyrene colloids as a quasi-hexagonal array of microlenses which can be used for the patterning of antidots by optical lithography. 26 Such patterned samples show vortex associated microwave losses in perpendicular magnetic fields B 27 mT, which are more than one order of magnitude smaller than for reference samples without antidots. The presented results may also be relevant for other superconducting thin film microelectronic devices, e.g., kinetic inductance detectors, filters, or quantum interference devices, when operated in external magnetic fields.…”

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confidence: 90%

Reducing vortex losses in superconducting microwave resonators with microsphere patterned antidot arrays

Bothner

Clauss

Koroknay

et al. 2012

Applied Physics Letters

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We experimentally investigate the vortex induced energy losses in niobium coplanar waveguide resonators with and without quasihexagonal arrays of nanoholes (antidots), where large-area antidot patterns have been fabricated using self-assembling microsphere lithography. We perform transmission spectroscopy experiments around 6.25 and 12.5 GHz in magnetic field cooling and zero field cooling procedures with perpendicular magnetic fields up to B = 27 mT at a temperature T = 4.2 K. We find that the introduction of antidot arrays into resonators reduces vortex induced losses by more than one order of magnitude.

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confidence: 90%

Reducing vortex losses in superconducting microwave resonators with microsphere patterned antidot arrays

Bothner

Clauss

Koroknay

et al. 2012

Applied Physics Letters

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“…There are many different methods, such as photolithography [1], LIGA [2], FIB (Focused Ion Beam) technology [3], nanoimprint [4] and tip based nanomanufacturing (TBN) [5]. Among all of these methods, every technique has its own advantages and special applications, but the tip based micro/nano machining is attracting more and more attention for the low-cost, simple operation and high accuracy.…”

Section: Introductionmentioning

confidence: 99%

Experimental investigation of the tip based micro/nano machining

Guo

Tian

Liu

et al. 2017

Applied Surface Science

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Based on the self-developed three dimensional micro/nano machining system, the effects of machining parameters and sample material on micro/nano machining are investigated. The micro/nano machining system is mainly composed of the probe system and micro/nano positioning stage. The former is applied to control the normal load and the latter is utilized to realize high precision motion in the xy plane. A sample examination method is firstly introduced to estimate whether the sample is placed horizontally. The machining parameters include scratching direction, speed, cycles, normal load and feed. According to the experimental results, the scratching depth is significantly affected by the normal load in all four defined scratching directions but is rarely influenced by the scratching speed. The increase of scratching cycle number can increase the scratching depth as well as smooth the groove wall. In addition, the scratching tests of silicon and copper attest that the harder material is easier to be removed. In the scratching with different feed amount, the machining results indicate that the machined depth increases as the feed reduces. Further, a cubic polynomial is used to fit the experimental results to predict the scratching depth. With the selected machining parameters of scratching direction d3/d4, scratching speed 5μm/s and feed 0.06μm, some more micro structures including stair, sinusoidal groove, Chinese character "田", "TJU" and Chinese panda have been fabricated on the silicon substrate.

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“…The sample was soft-baked at 90 C for 90 s. Polystyrene (PS) microspheres (BangsLabs) were deposited on the sample by means of the home-made deposition set-up [21]. Microsphere-coated sample was exposed to UV source (Q4000) for 2 s while the stage of sample is tilted 15 .…”

Section: Methodsmentioning

confidence: 99%

Tilted exposure microsphere nanolithography for high-throughput and mask-less fabrication of plasmonic molecules

Bonakdar¹,

Jang²,

Mohseni³

2013

SPIE Proceedings

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Fabrication of nanostructures for applications such as plasmonics and metamaterials are typically accompanied by a slow production and limited area due to the required sub-micron feature sizes. In these applications, periodic array of metal/dielectric features can produce optical resonance responses such as optical field enhancement response, Fano response, chiral response, and negative refractive index. Here, we propose a mask-less photolithography technique that can produce a variety of periodic nanostructure clusters. The method is based on microsphere nanolithography, which focuses UV field into the so-called photonic jet which is a propagative intensive field underneath the sphere. The position of photonic jet can be moved by changing the angle of exposure. The method introduces a controllable scheme to realize nano-gap size by controlling the angle of exposure. The feature sizes generated by this method are about one third of exposure wavelength. The method is compatible with highthroughput nano-manufacturing schemes, such as roll-to-roll production. Here we present some examples to demonstrate the capabilities of this method in producing an array of complex plasmonic molecules over a large area. The periodicity of array and element's diameter can be tuned by microsphere size and exposure/developing time, respectively. Tilted exposure lithography inherently is self-aligned and readily extendible to deep UV lithography due to absent of mask and optical elements. FDTD simulation agrees well with our experimental results, and suggests that much smaller feature sizes can be achieved at shorter wavelengths.

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Fabrication of Large Area Periodic Nanostructures Using Nanosphere Photolithography

Cited by 59 publications

References 6 publications

Reducing vortex losses in superconducting microwave resonators with microsphere patterned antidot arrays

Reducing vortex losses in superconducting microwave resonators with microsphere patterned antidot arrays

Experimental investigation of the tip based micro/nano machining

Tilted exposure microsphere nanolithography for high-throughput and mask-less fabrication of plasmonic molecules

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