Fabrication of Large Number Density Platinum Nanowire Arrays by Size Reduction Lithography and Nanoimprint Lithography

Xm, Yan; Kwon, S.; Am, Contreras; Bokor, Jeffrey; Ga, Somorjai

doi:10.1021/nl050228q

Cited by 73 publications

(53 citation statements)

References 21 publications

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“…There are many examples of features 10 nm and smaller fabricated via imprint technologies. [4][5][6][7] More recently, nanoimprint lithography has been attracting attention for reasons other than resolution and throughput. It is also capable of replicating complex multi-level or 3D patterns in a single imprint.…”

mentioning

confidence: 99%

“…It is also capable of replicating complex multi-level or 3D patterns in a single imprint. [7][8][9][10][11] Incumbent optical lithography requires multiple patterning steps to fabricate multi-level structures. Nanoimprint lithography also has the potential to directly pattern a range of materials, not just sacrificial resists that must then be combined with additive or subtractive processes to transfer the pattern into a functional material.…”

mentioning

confidence: 99%

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The Direct Patterning of Nanoporous Interlayer Dielectric Insulator Films by Nanoimprint Lithography

Ro¹,

Jones²,

Peng

et al. 2007

Advanced Materials

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Nanoscale parallel line‐space patterns are imprinted into a spin‐on organosilicate thin film that contains a second phase pore generating material (porogen). Imprints are converted into nanoporous low‐dielectric patterns by vitrification at 430 °C where the porogen is volatilized and creates nanoscale pores (2.2 nm) in the vitrified organosilicate network (see figure). The results are well‐defined, high‐modulus, nanoporous patterns with an estimated dielectric constant of k∼2.4.

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mentioning

confidence: 99%

mentioning

confidence: 99%

The Direct Patterning of Nanoporous Interlayer Dielectric Insulator Films by Nanoimprint Lithography

Ro¹,

Jones²,

Peng

et al. 2007

Advanced Materials

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“…Further applications include field emission electrodes [39,40] and quantum dots [41][42][43]. Silicon stamps for nanoimprint lithography have also been extensively explored [44][45][46][47][48][49][50][51].…”

Section: Introductionmentioning

confidence: 99%

NEMS by Sidewall Transfer Lithography

Liu

Syms

2014

J. Microelectromech. Syst.

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-A batch fabrication process for nano-electromechanical systems (NEMS) based on sidewall transfer lithography (STL) is demonstrated. STL is used to form nanoscale flexible silicon suspensions entirely by conventional photolithography. A two-step process for combining microscale and nanoscale features is used to fabricate double-ended and single-ended electrothermal actuators with a minimum feature width of 100 nm and an aspect ratio of 40 : 1. All devices are fabricated by deep reactive ion etching in 4.5 µm thick silicon using bonded silicon-on-insulator material. The process could allow low cost fabrication of nanoscale sensors and actuators.

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“…The field of metal heterogeneous catalyst developed rapidly by use of model catalyst, first single crystal surface [1], then monodispersed nanoclusters deposited on oxide surface by lithography techniques [2][3][4][5][6][7] or by colloid chemistry [8][9][10][11][12]. While single crystal could reproduce many of the elementary steps of industrial catalytic reactions where there is only one product (quinoline synthesis, carbon monoxide oxidation, and ethylene hydrogenation), for multi-path reaction with several reaction products the selectivity depends on ingredients such as the oxide-metal interface and the presence of a second metal that selectively blocks surface sites.…”

Section: Introductionmentioning

confidence: 99%

The Nanoscience Revolution: Merging of Colloid Science, Catalysis and Nanoelectronics

2008

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The incorporation of nanosciences into catalysis studies has become the most powerful approach to understanding reaction mechanisms of industrial catalysts and designing new-generation catalysts with high selectivity. Nanoparticle catalysts were synthesized via controlled colloid chemistry routes. Nanostructured catalysts such as nanodots and nanowires were fabricated with nanolithography techniques. Catalytic selectivity is dominated by several complex factors including the interface between active catalyst phase and oxide support, particle size and surface structure, and selective blocking of surface sites, etc. The advantage of incorporating nanosciences into the studies of catalytic selectivity is the capability of separating these complex factors and studying them one by one in different catalyst systems. The role of oxide-metal interfaces in catalytic reactions was investigated by detection of continuous hot electron flow in catalytic nanodiodes fabricated with shadow mask deposition technique. We found that the generation mechanism of hot electrons detected in Pt/TiO 2 nanodiode is closely correlated with the turnover rate under CO oxidation. The correlation suggests the possibility of promoting catalytic selectivity by precisely controlling hot electron flow at the oxide-metal interface. Catalytic activity of 1.7-7.2 nm monodispersed Pt nanoparticles exhibits particle size dependence, demonstrating the enhancement of catalytic selectivity via controlling the size of catalyst. Pt-Au alloys with different Au coverage grown on Pt(111) single crystal surface have different catalytic selectivity for four conversion channels of n-hexane, showing that selective blocking of catalytic sites is an approach to tuning catalytic selectivity. In addition, presence and absence of excess hydrogen lead to different catalytic selectivity for isomerization and dehydrocyclization of n-hexane on Pt(111) single crystal surface, suggesting that modification of reactive intermediates by the presence of coadsorbed hydrogen is one approach to shaping catalytic selectivity. Several challenges such as imaging the mobility of adsorbed molecules during catalytic reactions by high pressure STM and removing polymeric capping agents from metal nanoparticles remain.

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Fabrication of Large Number Density Platinum Nanowire Arrays by Size Reduction Lithography and Nanoimprint Lithography

Cited by 73 publications

References 21 publications

The Direct Patterning of Nanoporous Interlayer Dielectric Insulator Films by Nanoimprint Lithography

The Direct Patterning of Nanoporous Interlayer Dielectric Insulator Films by Nanoimprint Lithography

NEMS by Sidewall Transfer Lithography

The Nanoscience Revolution: Merging of Colloid Science, Catalysis and Nanoelectronics

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