2018
DOI: 10.1541/ieejsmas.138.307
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Fabrication of PbS QD/Silicon Hybrid Infrared Photodiode for LSI Platform

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Cited by 5 publications
(3 citation statements)
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“…It can be seen from previous literature reports that in the vertical structure devices (Si–ZnO–PbS–Au), the devices irradiated from the Si side (back) only show weak light responsivity in the NIR region, and there is no obvious light response in the UV–Vis band. However, when the device is irradiated from the Au side (front), the device can show broadband spectral response. This result shows that when light irradiates the silicon substrate from the back, it will first reflect some photons, and then absorb and filter out the photons in the Vis region, thus reducing the absorption and utilization of photons by the device, as shown in Figure d. Therefore, the preparation of device structures that can be directly irradiated on materials is very innovative and positive.…”
Section: Resultsmentioning
confidence: 99%
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“…It can be seen from previous literature reports that in the vertical structure devices (Si–ZnO–PbS–Au), the devices irradiated from the Si side (back) only show weak light responsivity in the NIR region, and there is no obvious light response in the UV–Vis band. However, when the device is irradiated from the Au side (front), the device can show broadband spectral response. This result shows that when light irradiates the silicon substrate from the back, it will first reflect some photons, and then absorb and filter out the photons in the Vis region, thus reducing the absorption and utilization of photons by the device, as shown in Figure d. Therefore, the preparation of device structures that can be directly irradiated on materials is very innovative and positive.…”
Section: Resultsmentioning
confidence: 99%
“…We fabricated ZnO NWs/PbS QDs optoelectronic devices with an interdigitated electrode structure to maximize the utilization of photon energy. And the semiconductor material will not be covered by the interdigitated electrodes, so there is no need to worry about the damage to the semiconductor film caused by the deposition of the electrode, and the beam can be directly irradiated on the semiconductor material, avoiding the substrate reflection and absorption loss caused by back lighting. …”
Section: Introductionmentioning
confidence: 99%
“…We fabricated a PbS CQDs/Si heterojunction for an IRsensitive photodiode; however, the quantum efficiency exhibited by this junction was quite low [16], [17]. To improve the performance, a thin ZnO layer as a carrier collection layer was inserted between PbS/Si interface [13], [18], [19].…”
Section: Introductionmentioning
confidence: 99%