Formation of Aromatic Siloxane Self-Assembled Monolayers

Abstract

We describe reproducible protocols for the chemisorption of self-assembled monolayers (SAMs), useful as imaging layers for nanolithography applications, from p-chloromethylphenyltrichlorosilane (CMPS) and 1-(dimethylchlorosilyl)-2-(p,m-chloromethylphenyl)ethane on native oxide Si wafers. Film chemisorption was monitored and characterized using water contact angle, X-ray photoelectron spectroscopy, and ellipsometry measurements. Atomic force microscopy was used to monitor the onset of multilayer deposition for CMPS films, ultimately allowing film macroscopic properties to be correlated with their surface coverage and nanoscale morphologies. Although our results indicate the deposition of moderate coverage, disordered SAMs under our conditions, their quality is sufficient for the fabrication of sub-100-nm-resolution metal features. The significance of our observations on the design of future imaging layers capable of molecular scale resolution in nanolithography applications is briefly discussed.

Transfer‐Free Growth of Few‐Layer Graphene by Self‐Assembled Monolayers

“…[ 21 ] This allows more phenyl-SAM molecules to be adsorbed within the unit structure. [ 22 ] As a consequence, the observed number of graphene layers is slightly larger than the theoretical value. We emphasize that aromatic SAM provides uniform multilayer graphene compared to aliphatic SAM.…”

Conjugated Gold–Porphyrin Monolayers Assembled on Inorganic Surfaces

“…[51,79] After the tip effect deconvolution, we obtained an AFM image almost identical to the previous one. The peak-to-peak is 8.3 nm, the mean roughnessis0 .7 nm, and the meanwidth of the linear arrangements is 44 nm.…”

“…The plasmonic peak is at 513.2 nm, and the estimated mean diameter of these AuNPs is 4.8 nm. [48][49][50][51][52][53][54][55][56][57][58][59][60] The synthetic procedure presently adopted involves functionalization of SiO 2 and Si(100) hydrophilic substrate surfaces with the bi-functional chemisorptivet richloro[4-(chloromethyl)phenyl]silane, and furtherc ovalenta nchoring of the PH 2 TPP (Scheme 1). In fact, the DLS theory states that the electric dipole layer of both capping layer and solvent adhering to the surfaceo ft he particles influences their movement in the medium.…”

Self-assembling materials for lithographic patterning: overview, status, and moving forward

“…This metal film can be used as an etch mask in subsequent processing. The granular nature of the formed metal film limits the ultimate spatial resolution of this approach [4].…”