a b s t r a c t a r t i c l e i n f o
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Keywords:Hot wire CVD Ta alloys Filament agingThe exposure of Ta filaments to a pure NH 3 ambient in a hot wire chemical vapour deposition (HWCVD) reactor affects the resistance of the wires. For filament temperatures below 1950°C the resistance increases over time, which is probably caused by in-diffusion of N atoms. Using the filaments in a mixed SiH 4 and NH 3 atmosphere (under SiN x deposition conditions) the filaments are hardly affected. Only at the "cold" parts near the electrical contact SiN x deposition on the Ta filaments is observed. X-ray diffraction patterns and cross-section microscope images reveal that in a CH 4 , H 2 and NH 3 ambient the TaC 0.275 N 0.218 phase is formed on the surface of the filament. Annealing of these filaments at 2000°C causes the TaC0.275N0.218 structure to separate into Ta and Ta 2 C phases.