2013
DOI: 10.1016/j.surfcoat.2013.09.020
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Growth defect density in PVD hard coatings prepared by different deposition techniques

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Cited by 68 publications
(28 citation statements)
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“…It has been demonstrated that a smooth substrate surface finish provides a coating with a lower defect density, and accordingly, not only improves the adhesion of the coating but also improves the corrosion resistance and results in a lower friction coefficient within a tribological couple [6,[14][15][16][17]. Panjan et al have investigated the origin of growth defects and their distribution across a surface, demonstrating that the formation of growth defects is variable, both in time and in space [18].…”
Section: Introductionmentioning
confidence: 99%
“…It has been demonstrated that a smooth substrate surface finish provides a coating with a lower defect density, and accordingly, not only improves the adhesion of the coating but also improves the corrosion resistance and results in a lower friction coefficient within a tribological couple [6,[14][15][16][17]. Panjan et al have investigated the origin of growth defects and their distribution across a surface, demonstrating that the formation of growth defects is variable, both in time and in space [18].…”
Section: Introductionmentioning
confidence: 99%
“…Many studies have been performed on increasing the scratch resistance and hardness of glass using ceramic coatings . Recently, sol–gel, chemical vapor deposition (CVD), and physical vapor deposition (PVD) methods have attracted great attention because of their ability to reproducibly synthesize high‐quality films. Among them, PVD methods, such as sputtering, are often employed due to resulting coating uniformity, high scratch resistance, and precise thickness monitoring capability .…”
Section: Introductionmentioning
confidence: 99%
“…Indeed, since the surface of the substrate is the starting point for film growth, the surface topography (roughness, defects, impurities) has a direct impact on the final structure and morphology of the material. As a consequence of the presence of substrate surface defects, the films deposited by a PVD process may contain undesired defects such as hillocks, pinholes, and craters [67]. The formation of hillocks has been encountered in case of various processes such as evaporation and sputtering [79], ion beam assisted deposition (IBAD) [1011], chemical vapor deposition (CVD) [1213] and electroplating [14].…”
Section: Introductionmentioning
confidence: 99%