Heat transport in masks for deep X-ray lithography during the irradiation process

Neumann, M.; Pantenburg, F. J.; Rohde, Magnus; Sesterhenn, M.

doi:10.1016/s0026-2692(96)00038-9

Cited by 13 publications

(2 citation statements)

References 8 publications

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“…The temperature trend during the exposure process is explained above. In addition to the approximate estimate proposed, the temperatures of the x-ray mask and film fixed to a cooled substrate were calculated using the heat conductivity equation, as previously demonstrated [42][43][44]. For an average electron current of 70 mA in the synchrotron source at an electron energy of 1.2 GeV, a helium pressure in the exposure chamber of 80 mTorr, a proximity of 350 µm, a scanning speed of 20 mm s −1 , and a scanning amplitude of 30 mm, the overheating of the x-ray mask with a diameter of 25 mm was approximately 1 • relative to the substrate.…”

Section: Thermal Expansion Of X-ray Maskmentioning

confidence: 99%

Optimization of x-ray lithography conditions for fabrication of large arrays of high-aspect-ratio submicron pores

Nazmov

Goldenberg

Vasiliev

et al. 2021

J. Micromech. Microeng.

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Patterning using a focused ionizing radiation beam provides a high spatial resolution but is not feasible when creating large arrays of microstructures. We propose the optimization of x-ray lithography parameters to create submicropores in a low-sensitivity material (polyethylene terephthalate) using a wide x-ray beam. This optimization results in the fabrication of regularly arranged micropores with a high aspect ratio (over 20) and diameters of up to 0.4 µm across a large substrate area (up to several square centimeters).

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Section: Thermal Expansion Of X-ray Maskmentioning

confidence: 99%

Optimization of x-ray lithography conditions for fabrication of large arrays of high-aspect-ratio submicron pores

Nazmov

Goldenberg

Vasiliev

et al. 2021

J. Micromech. Microeng.

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show abstract

“…The thermoplastic deformation of masks for soft XRL has previously been extensively studied (We[ls, et al, 1988;Vladimirsky et al, 1989;Yamazaki et 31.. 1994;Neumann et al, 1997). However, these studies involve exposures at significantly lower x-rav power than at the APS and use thin membranes and absorber coatings.…”

Section: "4"mentioning

confidence: 99%