High-rate reactive high-power impulse magnetron sputtering of hard and optically transparent HfO 2 films

Vlček, Jaroslav; Belosludtsev, Alexandr; Rezek, J.; Houška, Jiří; Čapek, Jiří; Čerstvý, R.; Haviar, Stanislav

doi:10.1016/j.surfcoat.2015.08.024

Cited by 50 publications

(27 citation statements)

References 36 publications

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“…The sequential injection of gas portions causes a cyclic change of pressure conditions in the chamber. Before the next pulse of the gas, the pressure is lower than normal, which reduces the number of collisions and energy loss of the particles directed to the substrate [12][13][14][15]. Recently, there has also been some interest in a new modification of the sputtering method called gas impulse magnetron sputtering (GI MS) [16][17][18][19].…”

Section: Introductionmentioning

confidence: 99%

Comparison of the Physicochemical Properties of TiO2 Thin Films Obtained by Magnetron Sputtering with Continuous and Pulsed Gas Flow

et al. 2018

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In this paper, a comparison of TiO2 thin films prepared by magnetron sputtering with a continuous and pulsed gas flow was presented. Structural, surface, optical, and mechanical properties of deposited titanium dioxide coatings were analyzed with the use of a wide range of measurement techniques. It was found that thin films deposited with a gas impulse had a nanocrystalline rutile structure instead of fibrous-like anatase obtained with a continuous gas flow. TiO2 thin films deposited with both techniques were transparent in the visible wavelength range, however, a much higher refractive index and packing density were observed for coatings deposited by the pulsed gas technique. The application of a gas impulse improved the hardness and scratch resistance of the prepared TiO2 thin films.

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Section: Introductionmentioning

confidence: 99%

Comparison of the Physicochemical Properties of TiO2 Thin Films Obtained by Magnetron Sputtering with Continuous and Pulsed Gas Flow

et al. 2018

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“…In the last decade, hafnium dioxide (HfO 2 ) has been widely studied because of its attractive properties and potential technological applications [1][2][3][4][5][6][7][8][9]. A high transmittance over a wide wavelength range, a hydrophobic nature, and hardness represent an important combination required in optical coatings [1][2][3]10,11].…”

Section: Introductionmentioning

confidence: 99%

“…A high transmittance over a wide wavelength range, a hydrophobic nature, and hardness represent an important combination required in optical coatings [1][2][3]10,11]. HfO 2 is a material with a high refractive index (1.85-2.1) [3,12] and a low absorption from ultraviolet to the mid-infrared [1,4,5]. Various optical applications of HfO 2 thin films have been pursued such as, for example, chirped mirrors and band pass filters, UV mirrors with a high damage threshold, and heat mirrors for energy efficient windows.…”

Section: Introductionmentioning

confidence: 99%

Characterization of HfO2 Optical Coatings Deposited by MF Magnetron Sputtering

et al. 2019

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The aim of this work is to determine the influence of medium frequency magnetron sputtering powers on the various properties of hafnium dioxide (HfO2) thin films. Microstructure observations show that an increase in the sputtering power has a significant influence on HfO2 films’ microstructure. As-deposited hafnia thin films exhibit nanocrystalline structure with a monoclinic phase, however thr rise of the sputtering power results in an increase of crystallite sizes. Atomic force microscopy investigations show that the surface of the deposited films is smooth, crack-free, and composed of visible grains. The surface roughness and the value of the water contact angle increase with the increase of the sputtering power. Measurements of the optical properties show that HfO2 coatings are transparent in the visible wavelength range. A higher sputtering power causes a decrease of an average transmittance level and a simultaneous increase of the real part of the refractive index. Nanoindentation measurements reveal that the thin film hardness and Young’s elastic modulus increase with an increase in the sputtering power. Moreover, the results of plasticity index H/E and plastic resistance parameter H3/E2 are discussed. Based on the obtained results, a correlation between the sputtering power and the structural, surface, and optical properties, as well as the hardness and Young’s elastic modulus, were determined.

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“…Due to a high transmittance over a wide spectral range from the ultraviolet (200 nm) to near-infrared (1.2 µm), low optical absorption and dispersion [6][7][8], high reactive index (about 1.85-2.15) [2,9], wide band gap energy (E g = 5.8 eV) [1,10] and hydrophobic properties [2,9], hafnium dioxide is one of the most commonly used materials in optical applications [11,12]. Depending on the conditions, hafnium oxide can exist in one of the three polymorphous forms.…”

Section: Introductionmentioning

confidence: 99%

Influence of Material Composition on Structural and Optical Properties of HfO2-TiO2 Mixed Oxide Coatings

et al. 2016

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Abstract:In this paper the influence of material composition on the structural, surface and optical properties of HfO 2 -TiO 2 mixed oxide coatings was investigated and discussed. Five sets of thin films were deposited using reactive magnetron sputtering: HfO 2 , TiO 2 and three sets of mixed HfO 2 -TiO 2 coatings with various titanium content. The change in the material composition had a significant influence on the structural, surface and optical properties. All of the deposited coatings, except for (Hf 0.55 Ti 0.45 )O x , were nanocrystalline with crystallites ranging from 6.7 nm to 10.8 nm in size. Scanning electron microscopy measurements revealed that surface of nanocrystalline thin films consisted of grains with different shapes and sizes. Based on optical transmission measurements, it was shown that thin films with higher titanium content were characterized by a higher cut-off wavelength, refractive index and lower optical band gap energy. The porosity and packing density were also determined.

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High-rate reactive high-power impulse magnetron sputtering of hard and optically transparent HfO 2 films

Cited by 50 publications

References 36 publications

Comparison of the Physicochemical Properties of TiO2 Thin Films Obtained by Magnetron Sputtering with Continuous and Pulsed Gas Flow

Comparison of the Physicochemical Properties of TiO2 Thin Films Obtained by Magnetron Sputtering with Continuous and Pulsed Gas Flow

Characterization of HfO2 Optical Coatings Deposited by MF Magnetron Sputtering

Influence of Material Composition on Structural and Optical Properties of HfO2-TiO2 Mixed Oxide Coatings

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