2021 IEEE 71st Electronic Components and Technology Conference (ECTC) 2021
DOI: 10.1109/ectc32696.2021.00169
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High-speed, High-density, and Highly-manufacturable Cu-filled Through-Glass-Via Channel (Cu bridge) for Multi-chiplet Systems

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Cited by 6 publications
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“…A design concept of glass panel embedding technology was proposed; it embeds the concerned chip in the glass substrates with plated RDL and TGV to achieve a trace below 2 μm by adopting polymer RDL, providing a solution for warpage control [ 38 ]. Cu bridge design improves upon conformal Cu-filled via structures and has superior reliability against thermal stress [ 39 ].…”
Section: Introductionmentioning
confidence: 99%
“…A design concept of glass panel embedding technology was proposed; it embeds the concerned chip in the glass substrates with plated RDL and TGV to achieve a trace below 2 μm by adopting polymer RDL, providing a solution for warpage control [ 38 ]. Cu bridge design improves upon conformal Cu-filled via structures and has superior reliability against thermal stress [ 39 ].…”
Section: Introductionmentioning
confidence: 99%