HITEN 99. Third European Conference on High Temperature Electronics. (IEEE Cat. No.99EX372)
DOI: 10.1109/hiten.1999.827467
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High-temperature characterization of a PD SOI CMOS process with LDMOS and lateral bipolar structures

Stéphane Adriaensen
1
,
Vincent Dessard2,
Pierre Delatte
3
et al.
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