2018 IEEE 30th International Symposium on Power Semiconductor Devices and ICs (ISPSD) 2018
DOI: 10.1109/ispsd.2018.8393663
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Hot-carrier induced off-state leakage current increase of LDMOS and approach to overcome the phenomenon

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Cited by 9 publications
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“…Besides, such a topology will increase I off , which is concerning, especially after hot carrier stress. 13 Combining triple-RESURF and trenched-gate designs is an excellent way to enhance the LDMOS transistor's performance. Both designs can reduce R ON,SP , increase BV, consequently enhancing FoM.…”
Section: Introductionmentioning
confidence: 99%
“…Besides, such a topology will increase I off , which is concerning, especially after hot carrier stress. 13 Combining triple-RESURF and trenched-gate designs is an excellent way to enhance the LDMOS transistor's performance. Both designs can reduce R ON,SP , increase BV, consequently enhancing FoM.…”
Section: Introductionmentioning
confidence: 99%