1999
DOI: 10.1063/1.124479
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Hydrogen cleaning and smoothing of semiconductor surfaces: The case of II–VI compounds

Abstract: Hydrogen radicals produced by a dc plasma cell have been used for cleaning II–VI semiconductor substrates for molecular beam epitaxy. Surface and chemical analysis experiments, including scanning tunneling microscopy, show a clear improvement of the chemical purity and morphology of the surface prior and after epitaxial growth.

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