Hydrogen influence on the properties of amorphous carbon films for transparent conductive electrode by HFCVD

Tailored Hydrogen-Free Carbon Films by Tuning the sp2/sp3 Configuration

“…Carbon allotropes have been utilized as major components in many different fields, such as mechanical protection, electronic devices, and energy harvesting, owing to their superior properties, including high hardness, thermal conductivity, transparency, low electrical resistivity, and chemical inertness. Because such properties are strongly influenced by the hybridization configuration of carbon atoms, it is important to understand the relationship between the hybridization structure of carbon and its properties and to find the optimum synthesis conditions for carbon films with appropriate sp 2 /sp 3 ratios. − Generally, amorphous carbon (a-C) films show higher hardness, , transparency, and thermal stability than hydrogenated amorphous carbon (a-C:H) films . This has attracted much research interest from various application fields, including lubricative or protective coating, electromagnetic wave shielding, sensors, and biology. , In addition, advances in deposition techniques, such as high-power impulse magneto sputtering (HiPIMS), − electron cyclotron resonance sputtering, and unbalanced magnetron sputtering, have facilitated the synthesis of diverse carbon nanostructures, providing greater opportunities for carbon-based applications.…”

“…Because such properties are strongly influenced by the hybridization configuration of carbon atoms, it is important to understand the relationship between the hybridization structure of carbon and its properties and to find the optimum synthesis conditions for carbon films with appropriate sp 2 /sp 3 ratios. 4−9 Generally, amorphous carbon (a-C) films show higher hardness, 10,11 transparency, 12 and thermal stability 13 than hydrogenated amorphous carbon (a-C:H) films. 14 This has attracted much research interest from various application fields, including lubricative or protective coating, 15 electromagnetic wave shielding, 16 sensors, 17 and biology.…”

Effect of Mesoporous Silica as a Solid Precursor on the Properties of Silicon Oxycarbide Thin Films via Hot Filament Chemical Vapor Deposition

“…In the first approach (a) the deposition occurred in a low‐vacuum chamber with a base pressure of 14 kPa. Hydrogen gas, flowing at a rate of 90 sccm, served as a carrier gas and prevented direct oxygen interaction on the heated tungsten wire surface [17] . Thin films were deposited onto p‐type silicon substrates with a thickness ranging from 27920 μm and a resistivity in the range of 1–10 Ωcm, following substrate cleaning procedures based on Radio Corporation America RCA I and RCA II protocols [18,19] .…”

“…Hydrogen gas, flowing at a rate of 90 sccm, served as a carrier gas and prevented direct oxygen interaction on the heated tungsten wire surface. [17] Thin films were deposited onto p-type silicon substrates with a thickness ranging from 27920 μm and a resistivity in the range of 1-10 Ωcm, following substrate cleaning procedures based on Radio Corporation America RCA I and RCA II protocols. [18,19] To initiate the deposition process, 25 mL of TEOS was poured into a flask connected to both a high-purity hydrogen gas tank and the HFCVD reaction chamber.…”