2018
DOI: 10.1107/s1600576718007367
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In situ and real-time monitoring of structure formation during non-reactive sputter deposition of lanthanum and reactive sputter deposition of lanthanum nitride

Abstract: A real-time synchrotron radiation study of the crystalline phase, texture formation and resulting surface roughness during deposition of thin La and LaN films is presented. For LaN, the theoretically predicted metastable wurtzite and zincblende structures were found, while La assumes the expected NaCl structure.

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Cited by 15 publications
(8 citation statements)
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“…The lowest possible total energy of the wurtzite structure is also 16 meV (per formula unit) lower than that of the rock-salt structure. In our phonon calculations [not shown] for the wurtzite and zinc-blende structures, both are dynamically stable at 0 K. Our theoretical results thereby support the recent experimental findings of synthesized wurtzite and zinc-blende LaN [52].…”
Section: Resultssupporting
confidence: 88%
See 1 more Smart Citation
“…The lowest possible total energy of the wurtzite structure is also 16 meV (per formula unit) lower than that of the rock-salt structure. In our phonon calculations [not shown] for the wurtzite and zinc-blende structures, both are dynamically stable at 0 K. Our theoretical results thereby support the recent experimental findings of synthesized wurtzite and zinc-blende LaN [52].…”
Section: Resultssupporting
confidence: 88%
“…Indeed, a previous X-ray diffraction (XRD) experiment has reported the observation of rock-salt LaN [51]. However, a recent experiment using magnetron sputtering found only wurtzite and zinc blende structures for LaN [52]. As a result, we begin by using DFT to examine the structural stability.…”
Section: Resultsmentioning
confidence: 99%
“…2a) of La dopants in Ta 3 N 5 has well-separated 3d 5/2 and 3d 3/2 spin-orbit components, each of which can be deconvoluted into two sets of Gaussian peaks. For the 3d 5/2 component, the peaks at 830.8 and 834.7 eV are attributed to La 3+ in the oxidation state and its satellites peak 25,26 , respectively, while the peaks at 837.3 and 840.9 eV correspond to La-N bonds 27,28 . Quantitative XPS analyses show that the La/Ta ratio in the La-doped Ta 3 N 5 thin film is 2.97%.…”
Section: Resultsmentioning
confidence: 99%
“…A further reduction in the working wavelength to 6.7 nm and the use of beyond extreme ultraviolet (BEUV) radiation will boost the performance of microprocessors even more [5,9]. Significant efforts were directed into this direction by ASML, which is the world's largest manufacturer of DUV and EUV lithographical equipment [10][11][12][13][14].…”
Section: Introductionmentioning
confidence: 99%