Impact of pulse duration in high power impulse magnetron sputtering on the low-temperature growth of wurtzite phase (Ti,Al)N films with high hardness

Shimizu, Tetsuhide; Teranishi, Yutaka; Morikawa, Kazuo; Komiya, Hidetoshi; Watanabe, Takamitsu; Nagasaka, Hiroshi; Yang, Ming

doi:10.1016/j.tsf.2014.11.076

Cited by 28 publications

(9 citation statements)

References 41 publications

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“…The range of 13.5–19.7 GPa in this study confirms very good hardness of the bulk TiN nanoceramics. The remarkably high hardness of the metastable cubic Ti 1−x Al x N was mentioned earlier [ 31 , 32 , 33 , 34 , 35 , 36 , 37 ]. Although Ti 1–x A x N is not encountered in our ceramics, it is worth quoting its indentation hardness of 24–37 GPa, which is markedly decreased at high temperatures [ 65 ].…”

Section: Resultsmentioning

confidence: 65%

“…In rare cases, the “phase of Ti 1−x Al x N” has appeared up-front to be an intimate mixture of c-TiN and amorphous AlN domains [ 35 ]. Otherwise, the hard and resistant coatings were unusually shown to have a metastable hexagonal Ti 1−x Al x N structure [ 37 ]. In conclusion, even under elevated temperature conditions, the powder forms of h-AlN and c-TiN are not expected to form solid solutions but rather to coexist as a heterogeneous composite system.…”

Section: Introductionmentioning

confidence: 99%

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Composite Nitride Nanoceramics in the System Titanium Nitride (TiN)-Aluminum Nitride (AlN) through High Pressure and High Temperature Sintering of Synthesis-Mixed Nanocrystalline Powders

et al. 2021

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Presented is a study on the original preparation of individual and in situ intimately mixed composite nanocrystalline powders in the titanium nitride-aluminum nitride system, Ti:Al = 1:1 (at.), which were used in high pressure (7.7 GPa) and high temperature (650 and 1200 °C) sintering with no binding additives for diverse individual and composite nanoceramics. First, variations in precursor processing pathways and final nitridation temperatures, 800 and 1100 °C, afforded a pool of mixed in the nanosized regime cubic TiN (c-TiN) and hexagonal AlN (h-AlN) composite nanopowders both with varying average crystallite sizes. Second, the sintering temperatures were selected either to preserve initial powder nanocrystallinity (650 °C was lower than both nitridation temperatures) or promote crystal growth and recrystallization (1200 °C was higher than both nitridation temperatures). Potential equilibration towards bimetallic compounds upon solution mixing of the organometallic precursors to nanopowders, monomeric Ti[N(CH3)2]4 and dimeric {Al[N(CH3)2]3}2, was studied with 1H and 13C NMR in C6D6 solution. The powders and nanoceramics, both of the composites and individual nitrides, were characterized if applicable by powder XRD, FT-IR, SEM/EDX, Vicker’s hardness, and helium density. The Vicker’s hardness tests confirmed many of the composite and individual nanoceramics having high hardnesses comparable with those of the reference h-AlN and c-TiN ceramics. This is despite extended phase segregation and, frequently, closed microsized pore formation linked mainly to the AlN component. No evidence was found for metastable alloying of the two crystallographically different nitrides under the applied synthesis and sintering conditions. The high pressure and high temperature sintering of the individual and in situ synthesis-mixed composite nanopowders of TiN-AlN was demonstrated to yield robust nanoceramics.

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Section: Resultsmentioning

confidence: 65%

Section: Introductionmentioning

confidence: 99%

Composite Nitride Nanoceramics in the System Titanium Nitride (TiN)-Aluminum Nitride (AlN) through High Pressure and High Temperature Sintering of Synthesis-Mixed Nanocrystalline Powders

et al. 2021

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“…Shimizu et al [75] reported on the deposition of TiAlN by HiPIMS under a low temperature condition. They obtained a higher hardness TiAlN coating with relatively smoother surfaces than that achieved by conventional DCMS.…”

Section: Hard Coatingsmentioning

confidence: 99%

High power impulse magnetron sputtering and its applications

Yang

Liu

Chen

2018

Plasma Sci. Technol.

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High power impulse magnetron sputtering (HiPIMS) has attracted a great deal of attention because the sputtered material is highly ionized during the coating process, which has been demonstrated to be advantageous for better quality coating. Therefore, the mechanism of the HiPIMS technique has recently been investigated. In this paper, the current knowledge of HiPIMS is described. We focus on the mechanical properties of the deposited thin film in the latest applications, including hard coatings, adhesion enhancement, tribological performance, and corrosion protection layers. A description of the electrical, optical, photocatalytic, and functional coating applications are presented. The prospects for HiPIMS are also discussed in this work.

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“…High power pulsed magnetron sputtering (HPPMS), including high power impulse magnetron sputtering (HiPIMS), is attracting attention as an ionized physical vapor deposition (I-PVD) technique [1][2][3][4][5] that enables the formation of high-performance films with high hardness, smoothness and adhesiveness [6][7][8]. Several running systems with different types of high voltage pulsed power supplies have been proposed for HPPMS.…”

Section: Introductionmentioning

confidence: 99%

Dependence of Optical Emission Spectra on Argon Gas Pressure during Modulated Pulsed Power Magnetron Sputtering (MPPMS)

Sanekata

Nishida

Nakagomi

et al. 2021

Plasma

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Modulated pulsed power magnetron sputtering (MPPMS) of titanium was investigated as a function of argon gas pressure using optical emission spectroscopy (OES). Delays in discharge and the formation of comb-like discharge current waveforms due to splitting and pulsing were observed with a decrease in pressure. This observation corresponds to the evolution from MPPMS condition to deep-oscillation-magnetron-sputtering (DOMS)-like condition by changing discharge gas pressure. The optical emission intensities of the ionic species (Ar+ and Ti+) increased as the comb-like current waveforms were formed with decreasing Ar pressure. This behavior showed a marked contrast to that of the neutral species (Ar and Ti). The Ar pressure dependence of OES was revealed to be due to the plasma build-up stage, which is the initial generation process of plasma discharge in pulsed dc magnetron sputtering, from the temporal profile for the atomic-line intensities of the optically emitting species in MPPMS and DOMS-like plasmas.

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Impact of pulse duration in high power impulse magnetron sputtering on the low-temperature growth of wurtzite phase (Ti,Al)N films with high hardness

Cited by 28 publications

References 41 publications

Composite Nitride Nanoceramics in the System Titanium Nitride (TiN)-Aluminum Nitride (AlN) through High Pressure and High Temperature Sintering of Synthesis-Mixed Nanocrystalline Powders

Composite Nitride Nanoceramics in the System Titanium Nitride (TiN)-Aluminum Nitride (AlN) through High Pressure and High Temperature Sintering of Synthesis-Mixed Nanocrystalline Powders

High power impulse magnetron sputtering and its applications

Dependence of Optical Emission Spectra on Argon Gas Pressure during Modulated Pulsed Power Magnetron Sputtering (MPPMS)

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