IEEE Custom Integrated Circuits Conference 2006 2006
DOI: 10.1109/cicc.2006.320869
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Implications of Proximity Effects for Analog Design

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Cited by 97 publications
(30 citation statements)
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“…For example, the drain current of a deep-submicron MOSFET device can no longer be predicted by the long-channel models [12], due to various effects including carrier velocity saturation, vertical-field induced mobility degradation, drain-induced barrier lowering (DIBL), and narrow channel effects, only to name a few. In addition, the characteristics of each individual device can be further affected by random variability and proximity effects [13]. Hence, it is extremely difficult to design an optimal circuit in the presence of these complex phenomena without relying on computational aids, e.g.…”
Section: Leveraging Intent For Design Optimizationmentioning
confidence: 99%
“…For example, the drain current of a deep-submicron MOSFET device can no longer be predicted by the long-channel models [12], due to various effects including carrier velocity saturation, vertical-field induced mobility degradation, drain-induced barrier lowering (DIBL), and narrow channel effects, only to name a few. In addition, the characteristics of each individual device can be further affected by random variability and proximity effects [13]. Hence, it is extremely difficult to design an optimal circuit in the presence of these complex phenomena without relying on computational aids, e.g.…”
Section: Leveraging Intent For Design Optimizationmentioning
confidence: 99%
“…For analog circuits, the variations in process, supply voltage and temperature (PVT) will have considerable impact on offset, linearity, common-mode rejection ratio (CMRR), power supply rejection ratio (PSRR), etc. For 90 nm and below, layout effects such as well proximity effect (WPE) and shallow-trench isolation (STI) stress will result in bias-point shifts of 20-30% in analog circuits [7]. It is shown in [8] that though STI-stress causes large deviation in drain current and threshold voltage, it does not contribute to random mismatch.…”
Section: Process Variationsmentioning
confidence: 99%
“…Common compact transistor models, such as BSIM3, can be applied since this stress is constant. For reflecting local proximity effects of stress, the model generation BSIM4 has been introduced [4]. In contrast, variable mechanical stress is evident in many sensing devices, such as for pressure and acceleration, though compact modeling is far less detailed in the design of sensor systems as compared to digital and analog circuit design [5].…”
Section: Introductionmentioning
confidence: 99%