2020
DOI: 10.1002/pssa.202000406
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Improved Efficiency of Ultraviolet B Light‐Emitting Diodes with Optimized p‐Side

Abstract: Figure 6. Electrical and optical characteristics of a flip-chip-mounted 310 nm LED measured under DC. Inset: the corresponding emission spectrum measured at 350 mA.

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Cited by 5 publications
(4 citation statements)
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References 35 publications
(36 reference statements)
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“…The LED with good quality resulted in a low leakage current and low contact resistivity. Subsequently, this will reduce the forward voltage of the LED (Kolbe et al , 2020).…”
Section: Resultsmentioning
confidence: 99%
“…The LED with good quality resulted in a low leakage current and low contact resistivity. Subsequently, this will reduce the forward voltage of the LED (Kolbe et al , 2020).…”
Section: Resultsmentioning
confidence: 99%
“…AlGaN-based UVC and UVB LED heterostructures were grown on c-plane sapphire substrates by metal-organic vapor phase epitaxy [20,25]. The UVC LED heterostructure for emission at 265 nm was grown on a low defect density ELO AlN/sapphire template [26,27].…”
Section: Methodsmentioning
confidence: 99%
“…It consists of a 1 µm thick Al 0.76 Ga 0.24 N:Si current spreading layer, an Al 0.65 Ga 0.35 N:Si n-contact layer, an Al 0.63 Ga 0.37 N:Si/Al 0.48 Ga 0.52 N multiple quantum well (MQW), a 10 nm thick Al 0.85 Ga 0.15 N:Mg electron blocking heterostructure, and a 230 nm thick GaN:Mg p-contact layer. The UVB LED heterostructure for emission at 310 nm was grown on a planar AlGaN-AlN/sapphire template [25]. It consists of a 1.25 µm thick Al 0.55 Ga 0.45 N:Si current spreading layer, an In 0.015 Al 0.394 Ga 0.591 N:Si/In 0.015 Al 0.276 Ga 0.709 N MQW, a 15 nm Al 0.9 Ga 0.1 N:Mg electron blocking layer, a 100 nm Al 0.38 Ga 0.62 N:Mg cladding layer, and a 20 nm GaN:Mg p-contact layer.…”
Section: Methodsmentioning
confidence: 99%
“…The transparent conductive layer, the current spreading layer, current blocking layer [16][17][18] beneath the p-pad electrode and shapes diversity of electrode [19,20] are used extensively in the fabrication process of device. The short-period superlattice (SLs) [21] as the p-current spreading layers, n-type AlGaN/GaN/InGaN current spreading layer under multiple-quantum-wells (MQWs) active region [22], multi-layer stacked AlGaN/GaN structure [23] and n-GaN/p-GaN/n-GaN/p-GaN/n-GaN built-in junctions [24] in the n-GaN layer have been introduced in the InGaN/GaN LEDs to alleviate the current crowding effect. However, all these methods Crystals 2021, 11, 1203 2 of 7 have improved the current spreading, but also increase the complexity and uncontrollability of the experimental process to a certain extent.…”
Section: Introductionmentioning
confidence: 99%