“…The unloaded resistance is the "real" value for a device after it has been unrolled, stretched, or bent into the application shape. It takes into account any grain growth, crack bridging, or viscoelastic recovery of the substrate Glushko et al, 2014;Putz et al, 2015). Using OLM or SEM, in situ methods provide information about the COS, crack spacing evolution, and even the buckling strain of brittle films.…”